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BUZ71AFI

STMicroelectronics

BUZ71AFI by STMicroelectronics

STMicroelectronics BUZ71AFI is a N-CHANNEL FET with 50V DS Breakdown Voltage, 64A IDM, and 0.12 ohm RDS(on). Ideal for SWITCHING applications due to its SINGLE configuration with BUILT-IN DIODE. Package: PLASTIC/EPOXY, RECTANGULAR shape, THROUGH-HOLE terminals.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,271 parts In-Stock

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ComSIT Distribution GmbH

Germany . 1,050 parts In-Stock

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1,050

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Anansix

USA . 1,015 parts In-Stock

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1,015

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Digiode

USA . 859 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 4 parts In-Stock

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IDEA Electronic Components Group

UK . 2,377 parts In-Stock

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$0.981

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$0.883

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2,377

$0.981

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$0.883

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MKK Technologies

India . 1,000 parts In-Stock

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$1.844

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$1.844

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DigiPath Technology Company

USA . 1,000 parts In-Stock

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$1.844

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$1.844

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Corphita

USA . 4,300 parts In-Stock

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4,300

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Northwest PG Solutions

USA . 1,233 parts In-Stock

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Parana Technologies

USA . 585 parts In-Stock

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$1.173

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Native Components

USA . 174 parts In-Stock

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Assy Fe

Spain . 3 parts In-Stock

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Overview

Unlock the power of innovation with the BUZ71AFI by STMicroelectronics. Crafted with precision and expertise, this Power FET offers unparalleled performance in switching applications. With a focus on quality and reliability, STMicroelectronics delivers a product that exceeds expectations. Whether you're looking to enhance your designs or streamline your operations, the BUZ71AFI provides the value, efficiency, and versatility that customers demand. Elevate your projects with the trusted technology of STMicroelectronics.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and reliability, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs have high electron mobility, low on-resistance, and fast switching speeds, making them ideal for efficient power management.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode adds reverse polarity protection and allows for simpler circuit designs.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control power flow in electronic circuits.

Minimum DS Breakdown Voltage: 50 V

With a minimum breakdown voltage of 50V, this FET can handle high voltage applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer ease of operation and can be turned on by applying a positive voltage.

Maximum Pulsed Drain Current (IDM): 64 A

With a high pulsed drain current rating, this FET can handle sudden spikes in power without damage.

Avalanche Energy Rating (EAS): 50 mJ

The avalanche energy rating indicates the FET's ability to dissipate energy during breakdown conditions, improving overall reliability.

Maximum Power Dissipation (Abs): 35 W

With a high power dissipation rating, this FET can handle heat dissipation effectively, ensuring long-term reliability.

Maximum Turn On Time (ton): 165 ns

Fast turn-on time ensures quick response and efficient operation in switching applications.

Maximum Turn Off Time (toff): 145 ns

Low turn-off time reduces switching losses and improves overall efficiency in power management.

Maximum Drain-Source On Resistance: 0.12 ohm

Low on-resistance results in minimal power loss and efficient performance of the FET.

Technical Specifications

Power Field Effect Transistors (FET) BUZ71AFI attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

50 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

50 V

Maximum Drain Current (Abs) (ID):

11 A

Maximum Drain Current (ID):

11 A

Maximum Drain-Source On Resistance:

.12 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

150 pF

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation Ambient:

30 W

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

64 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

145 ns

Maximum Turn On Time (ton):

165 ns

Trade Compliance

BUZ71AFI Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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