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NDD02N40-1G

Onsemi

NDD02N40-1G by Onsemi

NDD02N40-1G by Onsemi is a Power FET with 400V DS Breakdown Voltage, 6.9A IDM, and 0.0055 ohm RDS(on). Ideal for applications requiring high power dissipation up to 39W in enhancement mode operation. Suitable for use in circuits where N-channel MOSFETs with built-in diode are needed.

Median Price

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Lifecycle Status

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3

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1k+

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Chip Stock

USA . 54,000 parts In-Stock

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AZTECH Wire

Italy . 874 parts In-Stock

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Component Stockers USA

USA . 531 parts In-Stock

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SupplyDigital Components

Austria . 5,399 parts In-Stock

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Problanco Electronics

Mexico . 4,762 parts In-Stock

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Kulean Microsystems

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Perfect Parts

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TANS Electronics

Latvia . 1,354 parts In-Stock

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South Africa . 398 parts In-Stock

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UHIMA Technologies

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Corphita

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Overview

Experience the power of innovation with the NDD02N40-1G by Onsemi. Crafted with precision and expertise, this Power Field Effect Transistor (FET) offers unparalleled quality and reliability. From its N-CHANNEL configuration to the built-in diode, this product is designed to exceed expectations. Whether you're in the automotive, industrial, or consumer electronics industry, this FET provides maximum performance with minimal power dissipation. Trust Onsemi to deliver cutting-edge technology that empowers your applications to reach new heights. Unlock the potential of your projects with the NDD02N40-1G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic material provides good electrical insulation and protection for the internal components, making the product durable and reliable.

Minimum DS Breakdown Voltage: 400 V

High breakdown voltage ensures that the transistor can handle high voltage applications without getting damaged, increasing its versatility.

Maximum Pulsed Drain Current (IDM): 6.9 A

High pulsed drain current rating allows the transistor to handle sudden spikes in current, making it suitable for demanding applications.

Maximum Power Dissipation (Abs): 39 W

Higher power dissipation capability ensures the transistor can handle high power levels without overheating, improving its reliability.

Maximum Operating Temperature: 150 °C

High operating temperature rating allows the transistor to operate in harsh environments without degrading performance, increasing its durability.

Maximum Drain-Source On Resistance: 0.0055 ohm

Low on-resistance leads to less power loss and heat generation in the transistor, improving efficiency and performance.

Technical Specifications

Power Field Effect Transistors (FET) NDD02N40-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

120 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

400 V

Maximum Drain Current (Abs) (ID):

1.7 A

Maximum Drain Current (ID):

1.7 A

Maximum Drain-Source On Resistance:

.0055 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

6.9 A

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NDD02N40-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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