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NDD03N50Z-1G

Onsemi

NDD03N50Z-1G by Onsemi

NDD03N50Z-1G by Onsemi is a Power FET with 500V DS Breakdown Voltage, 10A IDM, and 0.0033 ohm RDS. Ideal for power applications due to its 58W Pdiss, EAS of 120mJ, and N-CHANNEL configuration with built-in diode. Suitable for high-power circuits requiring efficient switching in enhancement mode operation.

Median Price

$0.343

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 2,656 parts In-Stock

1+ parts

-

100+ parts

$0.343

1k+ parts

$0.285

10k+ parts

$0.254

2,656

-

$0.343

$0.285

$0.254

DigiKey

USA . 2,656 parts In-Stock

1+ parts

-

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$0.290

2,656

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$0.290

Verical

USA . 1,906 parts In-Stock

1+ parts

-

100+ parts

-

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$0.386

10k+ parts

$0.318

1,906

-

-

$0.386

$0.318

Distributors (In-Stock)

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Digiode

USA . 309 parts In-Stock

1+ parts

$0.268

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309

$0.268

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Vyrian

USA . 427 parts In-Stock

1+ parts

$0.282

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427

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Bristol Electronics

USA . 150 parts In-Stock

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150

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Distributors (Availability)

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Corphita

USA . 1,059 parts In-Stock

1+ parts

$0.254

100+ parts

-

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1,059

$0.254

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Corohmni

South Africa . 280 parts In-Stock

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$0.282

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280

$0.282

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Component Stockers USA

USA . 3,902 parts In-Stock

1+ parts

$0.290

100+ parts

$0.270

1k+ parts

$0.240

10k+ parts

-

3,902

$0.290

$0.270

$0.240

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Kepictronics

USA . 13,000 parts In-Stock

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Kulean Microsystems

USA . 6,943 parts In-Stock

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6,943

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Authorized Procurement Solutions

USA . 6,000 parts In-Stock

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6,000

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SupplyDigital Components

Austria . 4,828 parts In-Stock

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4,828

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Problanco Electronics

Mexico . 3,755 parts In-Stock

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3,755

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Continental Prestige Electronics

USA . 2,656 parts In-Stock

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$0.258

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2,656

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$0.258

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Perfect Parts

USA . 2,531 parts In-Stock

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2,531

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TANS Electronics

Latvia . 1,524 parts In-Stock

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1,524

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UHIMA Technologies

Türkiye . 776 parts In-Stock

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776

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Overview

Experience the superior quality and reliability of Onsemi's NDD03N50Z-1G Power Field Effect Transistor. With a focus on cutting-edge technology, this N-channel transistor offers enhanced performance and efficiency in various applications. From power supplies to motor control systems, this single configuration with a built-in diode provides customers with unmatched value and benefits. Trust Onsemi for top-of-the-line components that deliver exceptional results every time.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material offers good insulation properties and mechanical strength, ensuring reliable performance in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON resistance and higher current-carrying capacity, making them suitable for high-power applications.

Minimum DS Breakdown Voltage: 500 V

With a high breakdown voltage, this FET can handle high voltages without breakdown, making it suitable for high voltage circuits.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are normally OFF devices, providing better control over the circuit operation and reducing power consumption when in standby.

Maximum Power Dissipation (Abs): 58 W

With a high power dissipation capability, this FET can handle high power levels without overheating, ensuring reliable operation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high-speed switching capabilities, low ON resistance, and high input impedance, making this FET ideal for power electronics applications.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can operate in harsh environments without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) NDD03N50Z-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

120 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

2.6 A

Maximum Drain Current (ID):

2.6 A

Maximum Drain-Source On Resistance:

.0033 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

10 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Element Material:

SILICON

Trade Compliance

NDD03N50Z-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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