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MTB50N06VLT4

Onsemi

MTB50N06VLT4 by Onsemi

MTB50N06VLT4 by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage and 147A IDM. Ideal for SWITCHING applications, it features a built-in DIODE, 0.032 ohm RDS(on), and 125W Pdiss. Suitable for surface mount designs, this MOSFET operates in ENHANCEMENT MODE up to 175 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

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Digiode

USA . 1,654 parts In-Stock

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ComSIT Distribution GmbH

Germany . 1,180 parts In-Stock

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ComSIT USA

USA . 1,180 parts In-Stock

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Vyrian

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Semi Source

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SupplyDigital Components

Austria . 7,653 parts In-Stock

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Authorized Procurement Solutions

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TANS Electronics

Latvia . 5,587 parts In-Stock

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Corphita

USA . 606 parts In-Stock

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Problanco Electronics

Mexico . 461 parts In-Stock

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UHIMA Technologies

Türkiye . 300 parts In-Stock

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Kulean Microsystems

USA . 170 parts In-Stock

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Corohmni

South Africa . 59 parts In-Stock

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Perfect Parts

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Overview

Experience the power of innovation with the MTB50N06VLT4 by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are perfect for switching applications. This N-CHANNEL transistor offers unparalleled performance and reliability, with a maximum pulsing drain current of 147 A and an avalanche energy rating of 265 mJ. With a maximum power dissipation of 125 W and a low on-resistance of 0.032 ohm, this transistor provides exceptional value and efficiency for your projects. Trust Onsemi to provide cutting-edge technology that exceeds expectations.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable plastic/epoxy material ensures long-lasting performance in various environments.

Polarity or Channel Type: N-CHANNEL

N-channel design allows for efficient switching operations and better performance.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode simplifies circuit design and enhances overall functionality.

Transistor Application: SWITCHING

Specifically designed for switching applications, ensuring optimal performance in such scenarios.

Surface Mount: YES

Easy to install and saves space on the PCB, making it ideal for compact designs.

Minimum DS Breakdown Voltage: 60 V

High breakdown voltage provides reliable protection and performance in demanding applications.

Maximum Pulsed Drain Current (IDM): 147 A

High pulsed drain current capability allows for handling peak loads effectively.

Maximum Power Dissipation (Abs): 125 W

High power dissipation rating ensures the component can handle heavy loads without overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Advanced MOSFET technology provides efficient power management and high-speed switching capabilities.

Maximum Operating Temperature: 175 °C

Wide operating temperature range ensures reliability and performance in various environmental conditions.

Technical Specifications

Power Field Effect Transistors (FET) MTB50N06VLT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

265 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

42 A

Maximum Drain Current (ID):

42 A

Maximum Drain-Source On Resistance:

.032 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

147 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTB50N06VLT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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