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FQD6N40C

Onsemi

FQD6N40C by Onsemi

FQD6N40C by Onsemi is a N-CHANNEL Power FET with 400V DS Breakdown Voltage and 18A IDM. Ideal for SWITCHING applications, it features a built-in DIODE, operates in ENHANCEMENT MODE, and has an EAS of 270mJ.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 1,447 parts In-Stock

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Digiode

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Native Components

USA . 303 parts In-Stock

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Northwest PG Solutions

USA . 1,307 parts In-Stock

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$12.736

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Kulean Microsystems

USA . 7,565 parts In-Stock

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A-Z Elektronik GmbH

Germany . 4,958 parts In-Stock

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TANS Electronics

Latvia . 4,579 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,305 parts In-Stock

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Supply Digital

USA . 1,352 parts In-Stock

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SupplyDigital Components

Austria . 1,211 parts In-Stock

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Corphita

USA . 1,137 parts In-Stock

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Kepictronics

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Corohmni

South Africa . 397 parts In-Stock

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Problanco Electronics

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UHIMA Technologies

Türkiye . 89 parts In-Stock

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Overview

Experience the power and efficiency of the FQD6N40C by Onsemi, a top-tier manufacturer known for delivering high-quality Power Field Effect Transistors. This N-CHANNEL transistor with a built-in diode is perfect for switching applications, offering customers reliability and performance at an unbeatable value. Whether you're looking to enhance your electronic projects or streamline your power management systems, the FQD6N40C is the perfect solution for all your needs. Trust in Onsemi for cutting-edge technology that empowers innovation and success.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material makes the transistor lightweight and durable.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON resistance and higher conductivity, making them efficient for switching applications.

Minimum DS Breakdown Voltage: 400 V

The high breakdown voltage ensures that the transistor can handle high voltages, making it suitable for various industrial applications.

Maximum Pulsed Drain Current (IDM): 18 A

The high pulsed drain current rating means the transistor can handle short bursts of high current, making it ideal for applications where power spikes occur.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature allows the transistor to operate reliably in high-temperature environments.

Maximum Drain-Source On Resistance: 1 ohm

The low ON resistance helps reduce power losses and improves efficiency in switching applications.

Technical Specifications

Power Field Effect Transistors (FET) FQD6N40C attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

FAST SWITCHING

Avalanche Energy Rating (EAS):

270 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

400 V

Maximum Drain Current (ID):

4.5 A

Maximum Drain-Source On Resistance:

1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQD6N40C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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