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FCP16N60N-F102

Onsemi

FCP16N60N-F102 by Onsemi

FCP16N60N-F102 by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage. It has a Max IDM of 48A and EAS of 355mJ, suitable for SWITCHING applications. Operating in ENHANCEMENT MODE, it offers 0.199 ohm RDS(on), making it ideal for high-power requirements up to 134.4W at temperatures ranging from -55 to 150 °C.

Median Price

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Lifecycle Status

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2

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1k+

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Vyrian

USA . 4,066 parts In-Stock

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Digiode

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Corohmni

South Africa . 183 parts In-Stock

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Advanced Electronics

New Zealand . 2,000 parts In-Stock

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$1.468

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AZTECH Wire

Italy . 400 parts In-Stock

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SupplyDigital Components

Austria . 5,101 parts In-Stock

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TANS Electronics

Latvia . 3,480 parts In-Stock

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Kulean Microsystems

USA . 2,920 parts In-Stock

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Problanco Electronics

Mexico . 2,759 parts In-Stock

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Corphita

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Kepictronics

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UHIMA Technologies

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Overview

Enhance your power switching applications with the FCP16N60N-F102 by Onsemi. This high-quality N-CHANNEL Power FET offers reliability and efficiency, thanks to Onsemi's reputation for top-notch manufacturing. Whether you're looking to upgrade your electronic devices or enhance industrial equipment, this transistor's built-in diode and 600V breakdown voltage provide the performance you need. Unlock the potential of your projects with the value and benefits that only Onsemi can provide.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

PLASTIC/EPOXY material makes the package durable and resistant to physical damage, ensuring the longevity of the product.

Minimum DS Breakdown Voltage: 600 V

High breakdown voltage allows for reliable operation in high voltage applications, providing safety and stability.

Maximum Pulsed Drain Current (IDM): 48 A

High pulsed drain current capability enables the transistor to handle sudden surges in current without being damaged.

Maximum Power Dissipation (Abs): 134.4 W

High power dissipation capability ensures efficient heat dissipation, preventing overheating and increasing the product's reliability.

Maximum Operating Temperature: 150 °C

Wide operating temperature range allows the transistor to perform reliably in various environmental conditions.

Technical Specifications

Power Field Effect Transistors (FET) FCP16N60N-F102 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

355 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

16 A

Maximum Drain Current (ID):

16 A

Maximum Drain-Source On Resistance:

.199 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

10 pF

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

181 ns

Maximum Turn On Time (ton):

82.6 ns

Trade Compliance

FCP16N60N-F102 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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