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BLF7G22L-100P,118

NXP Semiconductors

BLF7G22L-100P,118 by NXP Semiconductors

BLF7G22L-100P,118 from NXP Semiconductors is an N-channel enhancement mode MOSFET designed for high-performance applications. It operates at a max temp of 200 °C and withstands peak reflow temps up to 260 °C for 30s. Ideal for power management in RF amplifiers and industrial systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,090 parts In-Stock

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4,090

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Digiode

USA . 3,893 parts In-Stock

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Anansix

USA . 2,313 parts In-Stock

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Distributors (Availability)

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Native Components

USA . 135 parts In-Stock

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$0.339

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$0.325

135

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$0.325

Northwest PG Solutions

USA . 625 parts In-Stock

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$0.373

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$0.329

625

$0.373

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$0.329

AZTECH Wire

Italy . 712 parts In-Stock

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$8.890

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712

$8.890

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One Stop Electronics

USA . 1,001 parts In-Stock

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$29.050

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$29.050

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QUARKTWIN TECHNOLOGY LTD

USA . 24,176 parts In-Stock

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Corphita

USA . 3,775 parts In-Stock

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UNI Independent Distributors

Spain . 829 parts In-Stock

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829

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Overview

Elevate your electronic projects with the BLF7G22L-100P,118 from NXP Semiconductors. Renowned for their commitment to quality and innovation, NXP delivers this powerful N-channel FET designed for reliable performance in demanding applications. With its enhanced operating capabilities and robust thermal management, this transistor ensures optimal efficiency and longevity, making it the ideal choice for cutting-edge designs in communications, automotive, and industrial sectors. Unleash the potential of your creations today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are preferred for high-speed switching and more efficient operation, making this product suitable for a variety of applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide better control and higher performance in low-voltage applications, ensuring versatility in design.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and low power consumption, which helps in preserving battery life in portable devices.

Maximum Operating Temperature: 200 °C

With a maximum operating temperature of 200 °C, this FET can function reliably in high-temperature environments, enhancing its durability and reliability.

Maximum Time At Peak Reflow Temperature (s): 30

The ability to withstand 30 seconds at peak reflow temperature ensures compatibility with standard soldering processes, making it easier to integrate into various manufacturing practices.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C signifies robust construction, enabling the transistor to withstand soldering processes without performance degradation.

Technical Specifications

Power Field Effect Transistors (FET) BLF7G22L-100P,118 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

BLF7G22L-100P,118 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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