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BF997-TAPE-13

NXP Semiconductors

BF997-TAPE-13 by NXP Semiconductors

BF997-TAPE-13 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a dual gate, depletion mode operation with a max DS breakdown voltage of 20V and operates in the ultra-high frequency band. This surface-mount transistor ensures reliable performance up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 4,898 parts In-Stock

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Digiode

USA . 260 parts In-Stock

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260

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Anansix

USA . 238 parts In-Stock

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Native Components

USA . 84 parts In-Stock

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$1.907

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84

$1.907

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One Stop Electronics

USA . 455 parts In-Stock

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$2.050

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Northwest PG Solutions

USA . 2,373 parts In-Stock

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$2.098

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UNI Independent Distributors

Spain . 6,202 parts In-Stock

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Corphita

USA . 2,673 parts In-Stock

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Overview

Unlock the power of innovation with the BF997-TAPE-13 from NXP Semiconductors, a leader in high-quality semiconductor solutions. This N-channel RF Small Signal FET is designed for superior amplification in ultra-high frequency applications, ensuring reliable performance and efficiency. Its compact surface mount design makes integration seamless, giving you the edge in cutting-edge technology. Experience unparalleled quality and support from an industry pioneer – elevate your projects with the BF997 today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy construction ensures durability and reliability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide better performance and efficiency in amplification applications, making this a strong choice for RF applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances versatility by allowing for additional functionalities without requiring extra components.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET is ideal for applications needing signal boosting, especially in RF circuits.

Surface Mount: YES

Surface mount technology allows for compact designs and easy integration into modern electronic circuits.

Minimum DS Breakdown Voltage: 20 V

This voltage rating offers flexibility for various circuit designs while ensuring adequate protection against breakdown.

Package Shape: RECTANGULAR

The rectangular shape optimizes space utilization on PCBs, allowing for denser circuit layouts.

Terminal Form: GULL WING

Gull wing terminals enable reliable soldering and stronger mechanical connections, ensuring long-term stability in performance.

Operating Mode: DUAL GATE, DEPLETION MODE

The dual-gate operation provides enhanced control over the device, allowing for more precise amplification and signal processing.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

This capability makes it suitable for high-frequency applications, enhancing its performance in RF communication systems.

No. of Terminals: 4

With four terminals, this component is designed for straightforward integration into various circuit configurations.

Package Style (Meter): SMALL OUTLINE

The small outline package style is advantageous for space-constrained applications, making it easier to include in compact designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, ideal for modern amplifier designs.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows the device to function reliably in various environments, improving overall resilience.

Transistor Element Material: SILICON

Silicon is a widely-used semiconductor material known for its excellent electrical properties and performance reliability.

Maximum Drain Current (ID): 0.03 A

This maximum drain current rating enables the FET to handle sufficient load, making it suitable for a variety of applications.

Terminal Position: DUAL

Dual terminal positions provide flexibility in circuit design and layout, enhancing overall application compatibility.

Case Connection: SOURCE

A source case connection offers straightforward and efficient circuit integration, streamlining the design process.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF997-TAPE-13 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, DEPLETION MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF997-TAPE-13 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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