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STW16NK60Z

STMicroelectronics

STW16NK60Z by STMicroelectronics

STW16NK60Z by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 620V breakdown voltage, 14A max drain current, and 190W power dissipation. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 6,886 parts In-Stock

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Digiode

USA . 4,576 parts In-Stock

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4,576

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Chip Stock

USA . 4,485 parts In-Stock

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4,485

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Anansix

USA . 161 parts In-Stock

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161

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Zilex Electronics Inc.

Canada . 25 parts In-Stock

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25

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 639 parts In-Stock

1+ parts

$0.777

100+ parts

-

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$0.700

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639

$0.777

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$0.700

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MKK Technologies

India . 278 parts In-Stock

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$1.462

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278

$1.462

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DigiPath Technology Company

USA . 278 parts In-Stock

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$1.462

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278

$1.462

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AZTECH Wire

Italy . 1,052 parts In-Stock

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$14.350

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1,052

$14.350

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Corphita

USA . 4,649 parts In-Stock

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4,649

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Alle Elektronik GmbH

Germany . 4,088 parts In-Stock

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4,088

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Authorized Procurement Solutions

USA . 2,800 parts In-Stock

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2,800

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Parana Technologies

USA . 144 parts In-Stock

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$0.930

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144

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$0.930

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Overview

Unlock the potential of your designs with the STW16NK60Z from STMicroelectronics, a leader in innovative semiconductor solutions. This high-performance N-channel MOSFET delivers exceptional efficiency and reliability for your switching applications, ensuring optimal performance in demanding environments. With its robust build and trusted quality, STMicroelectronics empowers you to achieve outstanding results, reducing costs while enhancing durability and functionality in power management systems.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable and lightweight, this material ensures reliability in diverse operating environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their efficiency and higher electron mobility, making them suitable for high-speed applications.

Configuration: SINGLE WITH BUILT-IN DIODE

This configuration simplifies circuit design by providing built-in protection against reverse polarity.

Transistor Application: SWITCHING

Ideal for switching applications, providing fast response times and reduced power loss during operation.

Minimum DS Breakdown Voltage: 620 V

High breakdown voltage makes this FET suitable for high-voltage applications, enhancing safety and performance.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient space utilization in circuit designs and promotes better heat dissipation.

Terminal Form: THROUGH-HOLE

Through-hole mounting ensures robust mechanical strength and easy handling in various assembly processes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for better control over the conduction state, making it ideal for precise applications.

Maximum Pulsed Drain Current (IDM): 56 A

High pulsed drain current capability supports demanding applications, providing flexibility in design.

Avalanche Energy Rating (EAS): 360 mJ

High avalanche energy rating protects the device from transient conditions, improving reliability.

Maximum Drain Current (Abs) (ID): 14 A

Sufficient maximum drain current for various applications, ensuring reliable performance under load.

No. of Terminals: 3

Three terminals facilitate versatile circuit connections, making integration into designs straightforward.

Maximum Power Dissipation (Abs): 190 W

High power dissipation capability allows this FET to handle significant power levels without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mounting provides strong physical support, enhancing stability in various installations.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables low power consumption and high switching speeds, making it suitable for modern applications.

Maximum Operating Temperature: 150 °C

High operating temperature rating ensures reliability in extreme environments, contributing to longer operational life.

Transistor Element Material: SILICON

Silicon material offers excellent electrical properties, ensuring efficiency and performance.

Terminal Finish: Matte Tin (Sn)

Matte tin finish provides good solderability and corrosion resistance, enhancing durability in use.

Maximum Drain Current (ID): 14 A

Reiterated maximum drain current rating reinforces its capability to handle substantial load.

Maximum Drain-Source On Resistance: 0.42 ohm

Low on-resistance minimizes power loss and heat generation, improving overall efficiency in operation.

Terminal Position: SINGLE

Single terminal position simplifies layout and connection, aiding in compact and efficient designs.

Technical Specifications

Power Field Effect Transistors (FET) STW16NK60Z attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

360 mJ

Minimum DS Breakdown Voltage:

620 V

Maximum Drain Current (Abs) (ID):

14 A

Maximum Drain Current (ID):

14 A

Maximum Drain-Source On Resistance:

.42 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

56 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW16NK60Z Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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