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STV200N55F3

STMicroelectronics

STV200N55F3 by STMicroelectronics

STV200N55F3 from STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 200 A, a breakdown voltage of 55 V, and low on-resistance of 0.0025 Ω. Ideal for high-power circuits, it ensures reliable performance in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 4,189 parts In-Stock

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Anansix

USA . 1,718 parts In-Stock

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1,718

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Digiode

USA . 1,105 parts In-Stock

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1,105

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,259 parts In-Stock

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$1.699

100+ parts

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$1.529

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1,259

$1.699

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$1.529

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MKK Technologies

India . 1,118 parts In-Stock

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$3.195

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$3.195

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DigiPath Technology Company

USA . 1,118 parts In-Stock

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$3.195

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1,118

$3.195

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AZTECH Wire

Italy . 492 parts In-Stock

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$22.150

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492

$22.150

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Alle Elektronik GmbH

Germany . 4,002 parts In-Stock

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Corphita

USA . 3,265 parts In-Stock

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Perfect Parts

USA . 1,943 parts In-Stock

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Parana Technologies

USA . 748 parts In-Stock

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$2.032

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Overview

Unlock superior performance with the STV200N55F3 from STMicroelectronics, a leader in semiconductor innovation. This N-channel power FET excels in efficiency and reliability, making it ideal for demanding switching applications. Its compact design and built-in diode enhance versatility, ensuring seamless integration into your projects. Experience unmatched quality and performance that drives your success—STMicroelectronics delivers excellence you can trust.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material in the package provides durability and protects the FET from environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their higher electron mobility, resulting in better performance and efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode enhances protection and simplifies design by eliminating the need for external components.

Transistor Application: SWITCHING

Designed for switching applications, this FET ensures fast operation, making it suitable for power management and control.

Surface Mount: YES

Surface mount capability allows for compact designs and easier integration into modern circuit boards, improving space efficiency.

Minimum DS Breakdown Voltage: 55 V

A breakdown voltage of 55 V provides sufficient headroom for typical applications, ensuring reliability under most operating conditions.

Package Shape: RECTANGULAR

The rectangular shape of the package facilitates easy layout and optimization on PCBs, enhancing overall design flexibility.

Terminal Form: GULL WING

Gull wing terminals provide excellent soldering characteristics and ensure strong mechanical connections to the board.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs require no gate current to remain off, reducing power consumption and improving efficiency in low-power applications.

Maximum Pulsed Drain Current (IDM): 800 A

An IDM rating of 800 A allows this FET to handle large current spikes, making it suitable for high-performance applications.

Avalanche Energy Rating (EAS): 1000 mJ

The high avalanche energy rating indicates robustness against transient events, enhancing the reliability of the device in harsh conditions.

Maximum Drain Current (Abs) (ID): 200 A

With a maximum drain current of 200 A, this FET is capable of delivering substantial power, ideal for demanding applications.

No. of Terminals: 10

A 10-terminal configuration provides multiple connection options, improving the versatility of the device in different circuit designs.

Maximum Power Dissipation (Abs): 300 W

A maximum power dissipation of 300 W allows this FET to efficiently operate under heavy loads without overheating, ensuring longevity.

Package Style (Meter): SMALL OUTLINE

The small outline package style optimizes space on the circuit board, perfect for compact electronic designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology allows for reduced power consumption and improves switching speeds, making this FET highly efficient.

Transistor Element Material: SILICON

Silicon as the base material provides good thermal stability and electrical performance, making it a reliable choice for various applications.

Terminal Finish: MATTE TIN

Matte tin finish provides excellent solderability and resistance to corrosion, ensuring reliable connections over time.

Maximum Drain Current (ID): 200 A

With a maximum drain current of 200 A, this FET is capable of delivering substantial power, ideal for demanding applications.

Maximum Drain-Source On Resistance: 0.0025 ohm

A lower on-resistance enhances efficiency and minimizes energy losses during operation, making it well-suited for high-efficiency power applications.

Terminal Position: DUAL

Dual terminal positioning enhances layout flexibility and helps maintain signal integrity in complex circuit designs.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 makes this product moderately sensitive to moisture, indicating the need for proper handling during the manufacturing and assembly process.

Case Connection: DRAIN

A direct drain connection simplifies design and improves heat dissipation, especially in high-power applications.

Maximum Time At Peak Reflow Temperature (s): 30

A maximum peak reflow time of 30 seconds ensures the FET withstands typical soldering processes without compromising its integrity.

Peak Reflow Temperature °C: 250

A peak reflow temperature of 250 °C indicates compatibility with standard soldering processes, making it industry-friendly for assembly.

Technical Specifications

Power Field Effect Transistors (FET) STV200N55F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

1000 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

200 A

Maximum Drain Current (ID):

200 A

Maximum Drain-Source On Resistance:

.0025 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G10

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

10

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

800 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STV200N55F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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