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STV250N55F3

STMicroelectronics

STV250N55F3 by STMicroelectronics

STV250N55F3 from STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 250 A, a breakdown voltage of 55 V, and operates at up to 175 °C. Ideal for power management in compact designs, it offers low on-resistance and built-in diode functionality.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 5,797 parts In-Stock

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Digiode

USA . 2,128 parts In-Stock

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2,128

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Anansix

USA . 1,968 parts In-Stock

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1,968

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Legend Electronics Inc.

USA . 2 parts In-Stock

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IDEA Electronic Components Group

UK . 613 parts In-Stock

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$0.623

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-

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$0.561

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613

$0.623

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$0.561

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MKK Technologies

India . 1,243 parts In-Stock

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$1.171

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$1.171

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DigiPath Technology Company

USA . 1,243 parts In-Stock

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$1.171

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$1.171

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AZTECH Wire

Italy . 369 parts In-Stock

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$8.930

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369

$8.930

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Component Stockers USA

USA . 530 parts In-Stock

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$99.990

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530

$99.990

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Corphita

USA . 4,260 parts In-Stock

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4,260

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Parana Technologies

USA . 2,195 parts In-Stock

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$0.745

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2,195

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$0.745

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Perfect Parts

USA . 298 parts In-Stock

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Giza Technologies, Inc.

USA . 40 parts In-Stock

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Overview

Unlock the power of efficiency with the STV250N55F3 from STMicroelectronics. Renowned for their commitment to innovation and quality, STMicroelectronics delivers a robust N-channel FET designed for high-performance switching applications. This versatile component excels in demanding environments, ensuring reliability and longevity while optimizing energy consumption. Elevate your designs and experience unparalleled performance—transform your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy as the package body material ensures durability and resistance to environmental factors, enhancing longevity.

Polarity or Channel Type: N-CHANNEL

N-channel configuration typically offers lower on-resistance and higher efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies design and improves performance by providing intrinsic protection against reverse voltage.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET excels in efficiency and performance in various circuitry.

Surface Mount: YES

Surface mount capability allows for compact circuit design and facilitates automated assembly processes.

Minimum DS Breakdown Voltage: 55 V

A minimum breakdown voltage of 55 V provides versatility for applications requiring higher voltage tolerances.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on PCB layouts, enabling better design flexibility.

Terminal Form: GULL WING

Gull wing terminals improve soldering reliability and are ideal for automated assembly systems.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation results in better performance characteristics in various applications, producing less heat.

Maximum Pulsed Drain Current (IDM): 1000 A

A high pulsed drain current rating allows this FET to handle transient currents during operation, beneficial for various load applications.

Avalanche Energy Rating (EAS): 1000 mJ

The high avalanche energy rating indicates robustness against energy spikes, providing reliability in demanding environments.

Maximum Drain Current (Abs) (ID): 250 A

With a high absolute maximum drain current, this FET is suitable for heavy load applications without compromising performance.

No. of Terminals: 10

Ten terminals provide multiple connection options, enhancing circuit design versatility.

Maximum Power Dissipation (Abs): 300 W

A maximum power dissipation of 300 W ensures effective thermal management in high power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style is ideal for applications requiring compact components without sacrificing performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology supports high-speed switching and low power consumption, making this FET excellent for modern applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature guarantees reliability and performance in high-thermal environments.

Transistor Element Material: SILICON

Silicon as the element material contributes to the transistor's effectiveness in heat dissipation and electrical performance.

Terminal Finish: MATTE TIN

Matte tin terminal finish provides superior solderability and resistance to oxidation, improving connection reliability.

Maximum Drain Current (ID): 250 A

The maximum drain current of 250 A allows for extensive usability in a variety of high-current applications.

Maximum Drain-Source On Resistance: 0.0022 ohm

Low on-resistance minimizes power loss and heat generation, enhancing overall efficiency during operation.

Terminal Position: DUAL

Dual terminal positions improve layout flexibility, making it easier to integrate into various circuit designs.

Moisture Sensitivity Level (MSL): 3

Moderate moisture sensitivity ensures adequate handling and storage precautions, preventing damage during production.

Case Connection: DRAIN

Drain case connection simplifies design and ensures effective current flow management in circuits.

Maximum Time At Peak Reflow Temperature (s): 30

The specified reflow time supports reliable soldering during assembly without damaging the FET.

Peak Reflow Temperature °C: 250

A peak reflow temperature of 250 °C ensures compatibility with standard soldering processes in electronics manufacturing.

Technical Specifications

Power Field Effect Transistors (FET) STV250N55F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

1000 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

250 A

Maximum Drain Current (ID):

250 A

Maximum Drain-Source On Resistance:

.0022 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G10

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

10

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

1000 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STV250N55F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

Category top products 20

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