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STU60N55F3

STMicroelectronics

STU60N55F3 by STMicroelectronics

STU60N55F3 by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 80 A, a breakdown voltage of 55 V, and operates at up to 175 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,814 parts In-Stock

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Digiode

USA . 1,607 parts In-Stock

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Anansix

USA . 316 parts In-Stock

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316

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IDEA Electronic Components Group

UK . 1,070 parts In-Stock

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$1.452

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$1.307

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$1.452

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$1.307

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MKK Technologies

India . 103 parts In-Stock

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$2.730

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103

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DigiPath Technology Company

USA . 103 parts In-Stock

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$2.730

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103

$2.730

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AZTECH Wire

Italy . 680 parts In-Stock

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$13.020

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680

$13.020

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A-Z Elektronik GmbH

Germany . 5,328 parts In-Stock

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Perfect Parts

USA . 3,288 parts In-Stock

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Kepictronics

USA . 3,179 parts In-Stock

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Corphita

USA . 2,467 parts In-Stock

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Alle Elektronik GmbH

Germany . 1,200 parts In-Stock

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Parana Technologies

USA . 439 parts In-Stock

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$1.736

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$1.736

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Overview

Elevate your designs with the STU60N55F3 from STMicroelectronics, a leader in innovative semiconductor solutions. This high-performance N-channel Power FET delivers exceptional efficiency and reliability for demanding switching applications. With its robust build and advanced technology, you can trust that it will perform under pressure, ensuring longevity and stability. Experience the power of quality engineering and unlock new possibilities for your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body provides durability and resistance to environmental factors, making the product suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection against voltage spikes, providing added reliability in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures efficient control of electrical power in various circuits.

Minimum DS Breakdown Voltage: 55 V

With a minimum DS breakdown voltage of 55 V, this transistor can handle significant voltage levels, protecting your circuit from damage.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on circuit boards.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide a robust mechanical connection, ensuring stable performance in demanding environments.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation offers improved control characteristics and efficient switching performance.

Maximum Pulsed Drain Current (IDM): 320 A

The high pulsed drain current capacity makes this device suitable for high-power applications, ensuring reliability under peak load conditions.

Avalanche Energy Rating (EAS): 390 mJ

A high avalanche energy rating indicates robustness against transient voltage spikes, enhancing circuit reliability.

Maximum Drain Current (Abs) (ID): 80 A

The high maximum drain current allows this FET to be used in demanding power applications without risk of failure.

No. of Terminals: 3

A compact design with three terminals simplifies circuit layout while maintaining essential functionality.

Maximum Power Dissipation (Abs): 110 W

High power dissipation capability ensures that the FET can be used in high-performance applications without overheating.

Package Style (Meter): IN-LINE

An in-line package style offers ease of installation and increased compatibility with existing circuit designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology lends to high speed and effectiveness in signal processing, making this a desirable choice for modern electronics.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature allows for reliable operation in extreme conditions, expanding application possibilities.

Transistor Element Material: SILICON

Silicon is a standard semiconductor material that offers excellent performance characteristics and reliability.

Terminal Finish: MATTE TIN

Matte tin finishing enhances solderability, ensuring reliable connections during assembly and operation.

Maximum Drain Current (ID): 80 A

Consistent drain current specification supports stable operation in high-load applications.

Maximum Drain-Source On Resistance: 0.0085 ohm

Low on-resistance facilitates higher efficiency and lower power losses in switching applications.

Terminal Position: SINGLE

Single terminal position simplifies the design and integration process into circuits.

Case Connection: DRAIN

Drain connection ensures effective management of current flow, optimizing device performance.

Maximum Time At Peak Reflow Temperature (s): 30

Limited reflow time maximizes preservation of component integrity while ensuring effective soldering.

Peak Reflow Temperature °C: 260

A high peak reflow temperature specification suggests compatibility with various soldering processes, thereby enhancing manufacturability.

Technical Specifications

Power Field Effect Transistors (FET) STU60N55F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

390 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU60N55F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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