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STQ3NK50ZR-AP

STMicroelectronics

STQ3NK50ZR-AP by STMicroelectronics

STQ3NK50ZR-AP by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 500V breakdown voltage, 2A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 3,288 parts In-Stock

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3,288

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Vyrian

USA . 2,742 parts In-Stock

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2,742

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Anansix

USA . 2,033 parts In-Stock

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2,033

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,323 parts In-Stock

1+ parts

$1.146

100+ parts

-

1k+ parts

$1.032

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2,323

$1.146

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$1.032

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MKK Technologies

India . 356 parts In-Stock

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$2.156

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356

$2.156

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DigiPath Technology Company

USA . 356 parts In-Stock

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$2.156

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356

$2.156

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AZTECH Wire

Italy . 533 parts In-Stock

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$9.200

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533

$9.200

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Component Stockers USA

USA . 263 parts In-Stock

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$99.990

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263

$99.990

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Alle Elektronik GmbH

Germany . 4,175 parts In-Stock

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4,175

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Corphita

USA . 2,657 parts In-Stock

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2,657

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Parana Technologies

USA . 2,317 parts In-Stock

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$1.371

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2,317

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$1.371

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Overview

Unlock unparalleled performance with the STQ3NK50ZR-AP from STMicroelectronics, a leader in innovative semiconductor solutions. This robust N-channel power FET excels in high-efficiency switching applications, offering exceptional reliability and longevity. With its advanced design and built-in diode, it ensures optimal energy management for your projects. Experience the peace of mind that comes with ST's quality assurance and elevate your designs to new heights!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy casing enhances protection against environmental factors, ensuring reliable performance in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them ideal for power management applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and increases overall reliability by providing inherent protection against reverse voltage.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor excels in rapid on/off cycles, which is essential for efficient power management.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage of 500 V allows for use in high-voltage applications, increasing versatility in circuit designs.

Package Shape: ROUND

The round package shape can facilitate better heat dissipation and fit in various circuit configurations.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides robust mechanical stability and is ideal for high-power applications where durability is critical.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low standby power consumption and high efficiency in active operation.

Maximum Pulsed Drain Current (IDM): 2 A

With a maximum pulsed drain current of 2 A, this FET can handle brief high-load conditions, suiting it for dynamic switching environments.

Avalanche Energy Rating (EAS): 120 mJ

A high avalanche energy rating indicates the transistor can better handle transient conditions, improving reliability in high-stress applications.

Maximum Drain Current (Abs) (ID): 0.5 A

The specified maximum current rating makes this FET suitable for low power applications while ensuring safe operation.

No. of Terminals: 3

With three terminals, it offers straightforward connectivity for easy integration into circuits.

Maximum Power Dissipation (Abs): 3 W

The power dissipation capability ensures safe operation within thermal limits, making it suitable for continuous use.

Package Style (Meter): CYLINDRICAL

The cylindrical package style contributes to compact designs, allowing for integration into space-constrained environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures high efficiency, fast switching speeds, and lower power consumption, critical for modern electronic designs.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows for use in demanding applications, such as industrial and automotive environments.

Transistor Element Material: SILICON

Silicon is a widely used material in FETs, offering good performance and reliability for various electronic applications.

Terminal Finish: MATTE TIN

Matte tin finish provides excellent corrosion resistance and enhances solderability, improving assembly reliability.

Maximum Drain Current (ID): 0.5 A

The rated maximum drain current ensures safe operation under specified load conditions, vital for circuit longevity.

Maximum Drain-Source On Resistance: 3.3 ohm

A lower on-resistance reduces power losses and improves efficiency, making it suitable for energy-sensitive applications.

Terminal Position: BOTTOM

Bottom terminal positioning can improve board layout efficiency, allowing for compact and effective circuit designs.

Technical Specifications

Power Field Effect Transistors (FET) STQ3NK50ZR-AP attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

120 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

.5 A

Maximum Drain Current (ID):

.5 A

Maximum Drain-Source On Resistance:

3.3 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-92

JESD-30 Code:

O-PBCY-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

ROUND

Package Style (Meter):

CYLINDRICAL

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

3 W

Maximum Pulsed Drain Current (IDM):

2 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

BOTTOM

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STQ3NK50ZR-AP Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

Category top products 20

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