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STN2NE06

STMicroelectronics

STN2NE06 by STMicroelectronics

STN2NE06 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 2 A, a breakdown voltage of 60 V, and operates at up to 150 °C. Ideal for compact power management in electronics.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,182 parts In-Stock

1+ parts

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4,182

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Digiode

USA . 2,209 parts In-Stock

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2,209

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Anansix

USA . 976 parts In-Stock

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976

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,187 parts In-Stock

1+ parts

$1.634

100+ parts

-

1k+ parts

$1.471

10k+ parts

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1,187

$1.634

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$1.471

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MKK Technologies

India . 1,828 parts In-Stock

1+ parts

$3.072

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1,828

$3.072

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DigiPath Technology Company

USA . 1,828 parts In-Stock

1+ parts

$3.072

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10k+ parts

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1,828

$3.072

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Component Stockers USA

USA . 4,730 parts In-Stock

1+ parts

$20.370

100+ parts

$19.350

1k+ parts

$18.740

10k+ parts

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4,730

$20.370

$19.350

$18.740

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Kepictronics

USA . 13,000 parts In-Stock

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13,000

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Corphita

USA . 2,980 parts In-Stock

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2,980

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Parana Technologies

USA . 236 parts In-Stock

1+ parts

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$1.954

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236

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$1.954

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Overview

Unlock exceptional performance in your projects with the STN2NE06 from STMicroelectronics. Renowned for its quality and reliability, this N-channel power FET is perfect for switching applications, featuring a compact design that enhances your device's efficiency while simplifying integration. Experience superior durability with a robust thermal profile and built-in diode, making it an ideal choice for automotive, industrial, and consumer electronics. Elevate your designs with trusted innovation!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy as the package body material ensures durability and resistance to environmental stress.

Polarity or Channel Type: N-CHANNEL

N-channel configuration allows for efficient operation with better electron mobility, making it ideal for high-speed applications.

Configuration: SINGLE WITH BUILT-IN DIODE

A built-in diode simplifies circuit design, allowing for easier integration and greater efficiency in switching applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET provides fast response times and efficient control of high current and voltage.

Surface Mount: YES

Surface mount technology offers a compact design, facilitating better space utilization on PCBs and improved assembly processes.

Minimum DS Breakdown Voltage: 60 V

A minimum breakdown voltage of 60V ensures robust performance in high-voltage applications without risk of damage.

Package Shape: RECTANGULAR

The rectangular package shape is ideal for automated assembly and space-efficient placements on circuit boards.

Terminal Form: GULL WING

Gull wing terminals enhance solderability and provide a solid mechanical connection to PCBs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation leads to lower power losses and improved efficiency in various electronic devices.

Maximum Pulsed Drain Current (IDM): 8 A

With a high pulsed drain current rating, this FET can handle demanding transient conditions effectively.

Avalanche Energy Rating (EAS): 20 mJ

A high avalanche energy rating indicates that the device can withstand voltage spikes without failure, enhancing reliability.

Maximum Drain Current (Abs) (ID): 2 A

The maximum drain current of 2 A allows for efficient operation in applications where current control is crucial.

No. of Terminals: 4

Four terminals provide a versatile connection layout, accommodating various circuit designs.

Maximum Power Dissipation (Abs): 2.5 W

A maximum power dissipation rating of 2.5 W ensures the transistor can operate effectively without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to overall space savings in designs, ideal for compact electronic products.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high-speed operation and low power consumption, vital for modern electronic circuitry.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature of 150 °C ensures reliability in extreme temperature environments.

Transistor Element Material: SILICON

Silicon as the element material contributes to the stability and performance characteristics of the FET.

Terminal Finish: MATTE TIN

Matte tin terminal finishing enhances solderability and provides resistance to oxidation.

Maximum Drain Current (ID): 2 A

This rating allows for sturdy operation in applications where stable current flow is essential.

Maximum Drain-Source On Resistance: 0.25 ohm

Low on-resistance improves efficiency by minimizing energy losses during operation.

Terminal Position: DUAL

Dual terminal positioning increases design flexibility, accommodating various layout requirements.

Case Connection: DRAIN

Having the case connected to the drain allows for enhanced thermal performance and better heat dissipation.

Technical Specifications

Power Field Effect Transistors (FET) STN2NE06 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

20 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

2 A

Maximum Drain Current (ID):

2 A

Maximum Drain-Source On Resistance:

.25 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G4

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

8 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STN2NE06 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

Category top products 20

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