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STH8N80

STMicroelectronics

STH8N80 by STMicroelectronics

STH8N80 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain-source voltage of 800V, supports up to 35A pulsed current, and dissipates up to 180W. Ideal for high-power circuits, it operates in enhancement mode with fast turn-on times.

Median Price

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Lifecycle Status

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Digiode

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Anansix

USA . 2,199 parts In-Stock

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Vyrian

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Elcom Components

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LittleDiode

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Fibra_Brandt Electronic GMBH

Germany . 27 parts In-Stock

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EMSNET

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IDEA Electronic Components Group

UK . 988 parts In-Stock

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MKK Technologies

India . 1,524 parts In-Stock

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DigiPath Technology Company

USA . 1,524 parts In-Stock

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Perfect Parts

USA . 6,886 parts In-Stock

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Corphita

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Cyclops Electronics Ltd (Excess)

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Assy Fe

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Parana Technologies

USA . 540 parts In-Stock

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Overview

Unleash the power of efficiency with the STH8N80 from STMicroelectronics, a trusted leader in semiconductor innovation. This N-channel power FET excels in robust switching applications, ensuring reliability and performance where it matters most. With an impressive breakdown voltage and thermal management capabilities, it’s engineered for demanding environments. Choose the STH8N80 to elevate your designs while benefiting from ST's commitment to quality and cutting-edge technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy material ensures reliability and resistance to environmental factors, making the FET suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel devices typically offer better performance and higher efficiency, allowing for faster switching speeds and enhanced driving capability.

Configuration: SINGLE WITH BUILT-IN DIODE

This configuration simplifies circuit design and provides protection against reverse polarity, enhancing the overall reliability of the product.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can handle rapid on/off cycles, making it ideal for power management solutions.

Minimum DS Breakdown Voltage: 800 V

A high breakdown voltage allows the FET to operate safely in applications with significant voltage spikes, providing reliability in high-voltage circuits.

Package Shape: RECTANGULAR

The rectangular package shape offers efficient use of space and aids in thermal management, making installation straightforward in varied designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical connections and ease of soldering, ensuring secure placement on PCBs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low power consumption when the transistor is off, thereby improving energy efficiency in applications.

Maximum Pulsed Drain Current (IDM): 35 A

A high pulsed drain current rating allows the FET to manage short bursts of high current, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 800 mJ

This energy rating indicates robustness against transient events, enhancing reliability in harsh electrical environments.

Maximum Drain Current (Abs) (ID): 8.2 A

The maximum drain current capacity allows the FET to handle substantial loads, making it versatile for a range of power applications.

No. of Terminals: 3

The three terminals configuration simplifies integration into circuit designs while maintaining functionality and ease of use.

Maximum Power Dissipation (Abs): 180 W

High power dissipation capability means this FET can operate effectively in high-power applications without overheating.

Package Style (Meter): FLANGE MOUNT

The flange mount style facilitates secure mounting and improves thermal dissipation, essential for maintaining performance under load.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high switching speeds and low on-resistance, contributing to overall efficiency and performance of circuits.

Maximum Power Dissipation Ambient: 180 W

This capability under ambient conditions ensures that heat management strategies can be effectively designed for high-performance applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating allows the FET to function well in demanding environments, increasing application versatility.

Transistor Element Material: SILICON

Silicon is the standard for FETs, providing good thermal stability and performance, essential for reliable applications.

Maximum Turn On Time (ton): 135 ns

A fast turn-on time enhances switching performance, making the FET suitable for high-speed applications.

Maximum Drain Current (ID): 8.2 A

This rating for continuous operation reinforces the transistor's ability to operate effectively under sustained loads.

Maximum Drain-Source On Resistance: 1.2 ohm

A low on-resistance reduces power losses in the circuit, improving efficiency and performance in power management applications.

Terminal Position: SINGLE

A single terminal position simplifies circuit layout, making assembly easier and facilitating neater designs.

Maximum Feedback Capacitance (Crss): 150 pF

Low feedback capacitance supports high-frequency performance, making the FET suitable for RF applications.

Technical Specifications

Power Field Effect Transistors (FET) STH8N80 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

800 mJ

Minimum DS Breakdown Voltage:

800 V

Maximum Drain Current (Abs) (ID):

8.2 A

Maximum Drain Current (ID):

8.2 A

Maximum Drain-Source On Resistance:

1.2 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

150 pF

JEDEC-95 Code:

TO-218

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation Ambient:

180 W

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

35 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn On Time (ton):

135 ns

Trade Compliance

STH8N80 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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