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FQD3P50

Onsemi

FQD3P50 by Onsemi

FQD3P50 by Onsemi is a P-CHANNEL Power FET with 500V DS Breakdown Voltage. It features 8.4A IDM, 250mJ EAS for SWITCHING applications. This SINGLE configuration transistor has a 2.1A ID, 4.9Ω RDS(ON), and operates in ENHANCEMENT MODE for efficient power management.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 2,248 parts In-Stock

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Digiode

USA . 1,853 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 1,302 parts In-Stock

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Andel Nordic

Denmark . 490 parts In-Stock

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$11.040

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$10.598

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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SupplyDigital Components

Austria . 8,080 parts In-Stock

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Kulean Microsystems

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A-Z Elektronik GmbH

Germany . 5,084 parts In-Stock

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Perfect Parts

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Glotronic Ltd.

UK . 3,900 parts In-Stock

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Alle Elektronik GmbH

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Problanco Electronics

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Northwest PG Solutions

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TANS Electronics

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Supply Digital

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Corphita

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GreenTree Electronics

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Corohmni

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UHIMA Technologies

Türkiye . 157 parts In-Stock

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Overview

Unleash the power of innovation with the FQD3P50 by Onsemi, a top-of-the-line Power Field Effect Transistor designed to exceed expectations. Crafted with precision and expertise, this P-CHANNEL transistor offers unmatched performance in switching applications. With a minimum DS Breakdown Voltage of 500V and a maximum Drain Current of 2.1A, this transistor is built to handle even the most demanding tasks. Whether you're a seasoned professional or a tech enthusiast, the FQD3P50 delivers unparalleled value and reliability, making it the ideal choice for your next project. Elevate your designs with the trusted quality and cutting-edge technology of Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the FET, ensuring a longer lifespan.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are generally more efficient and have lower resistance, making them suitable for various applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode improves efficiency and protects against reverse current flow.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable performance in various circuits.

Surface Mount: YES

Easy to mount on circuit boards, saving space and enabling automated assembly.

Minimum DS Breakdown Voltage: 500 V

High breakdown voltage ensures the FET can handle high voltages without breakdown, making it suitable for industrial applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high input impedance and low on-resistance, improving overall performance.

Maximum Pulsed Drain Current (IDM): 8.4 A

Can handle high currents for short durations, making it suitable for pulse applications.

Avalanche Energy Rating (EAS): 250 mJ

Can withstand energy spikes, protecting the FET from damage in harsh operating conditions.

Maximum Drain Current (ID): 2.1 A

Sufficient drain current handling capability for many applications.

Maximum Drain-Source On Resistance: 4.9 ohm

Low on-resistance reduces power losses and improves efficiency in switching applications.

Technical Specifications

Power Field Effect Transistors (FET) FQD3P50 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

250 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

2.1 A

Maximum Drain-Source On Resistance:

4.9 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

8.4 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQD3P50 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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