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BLD6G21LS-50,112

NXP Semiconductors

BLD6G21LS-50,112 by NXP Semiconductors

BLD6G21LS-50,112 by NXP is an N-channel MOSFET designed for efficient power management. It supports a max drain current of 10.2 A and operates at temperatures up to 200 °C, making it ideal for high-performance applications in electronics. Its surface mount configuration enhances design flexibility.

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1k+

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RFMW

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Digiode

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Vyrian

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Anansix

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Native Components

USA . 629 parts In-Stock

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Northwest PG Solutions

USA . 570 parts In-Stock

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AZTECH Wire

Italy . 195 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Corphita

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Overview

Unlock superior performance with the BLD6G21LS-50,112 from NXP Semiconductors, a leader in high-quality semiconductor solutions. This N-channel power FET enhances efficiency and reliability in demanding applications like motor control, power management, and more. With its robust design and exceptional thermal capabilities, it ensures longevity and optimal operation. Choose NXP for innovation that drives your projects forward—experience unmatched value and performance today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher electron mobility, making them efficient for applications that require faster switching speeds.

Configuration: SINGLE

Single configuration provides simplicity in design, allowing for easier integration into various circuits without the complexity of multiple FETs.

Surface Mount: YES

Surface mount technology allows for compact designs and enables automated assembly processes, minimizing production costs and space requirements.

Operating Mode: ENHANCEMENT MODE

Enhancement mode enables the FET to remain off until a gate voltage is applied, providing better control and minimizing power loss during inactive states.

Maximum Drain Current (Abs) (ID): 10.2 A

With a maximum drain current of 10.2 A, this FET is suitable for applications that require handling significant power without overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high efficiency and low power consumption, making this product ideal for low-voltage applications and reducing overall energy costs.

Maximum Operating Temperature: 200 °C

High maximum operating temperature ensures reliability and performance in demanding environments, allowing the product to be used in diverse applications.

Maximum Time At Peak Reflow Temperature (s): 30

A maximum time of 30 seconds at peak reflow temperature ensures safe and effective soldering during assembly while protecting the integrity of the component.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C is compatible with most modern soldering processes, ensuring ease of manufacturing and a robust final product.

Technical Specifications

Power Field Effect Transistors (FET) BLD6G21LS-50,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

10.2 A

Maximum Drain Current (ID):

10.2 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

BLD6G21LS-50,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

Category top products 20

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