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BLA1011-200R,112

NXP Semiconductors

BLA1011-200R,112 by NXP Semiconductors

BLA1011-200R,112 by NXP Semiconductors is a single N-channel enhancement mode FET. It boasts a max power dissipation of 700 W and operates at temperatures up to 200 °C. Ideal for high-power applications in industrial and automotive sectors.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,493 parts In-Stock

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2,493

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Digiode

USA . 2,063 parts In-Stock

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2,063

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Anansix

USA . 1,735 parts In-Stock

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1,735

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Distributors (Availability)

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One Stop Electronics

USA . 1,487 parts In-Stock

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$13.050

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1,487

$13.050

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Native Components

USA . 513 parts In-Stock

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$20.542

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513

$20.542

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Northwest PG Solutions

USA . 848 parts In-Stock

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$22.597

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$20.337

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848

$22.597

$20.337

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Corphita

USA . 967 parts In-Stock

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UNI Independent Distributors

Spain . 767 parts In-Stock

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Overview

Elevate your projects with the BLA1011-200R,112 from NXP Semiconductors, a leader in innovation and quality. This powerful N-channel FET is designed to deliver exceptional performance while ensuring reliability in demanding applications. With its robust build and high operating temperature tolerance, it’s ideal for energy-efficient power management in automotive and industrial systems. Experience unmatched efficiency and peace of mind with NXP's trusted expertise!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer higher electron mobility, lower on-resistance, and better efficiency, making this product a great choice for high-performance applications.

Configuration: SINGLE

A single configuration simplifies circuit design and helps reduce costs while maintaining reliable performance for various applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are typically off at zero gate voltage, providing versatility and control over power management in circuits, ideal for digital and analog applications.

Maximum Power Dissipation (Abs): 700 W

With a maximum power dissipation of 700 W, this product is suited for high-power applications, ensuring reliable operation even under demanding conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high scalability, low power consumption, and high-speed operation, making this FET ideal for modern electronic applications.

Maximum Operating Temperature: 200 °C

A high maximum operating temperature of 200 °C ensures reliable performance in extreme environments, enhancing the durability and longevity of the product.

Technical Specifications

Power Field Effect Transistors (FET) BLA1011-200R,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Trade Compliance

BLA1011-200R,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

Category top products 20

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