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MTA4ATF51264AZ-2G3B1

Micron Technology

MTA4ATF51264AZ-2G3B1 by Micron Technology

MTA4ATF51264AZ-2G3B1 by Micron Technology is a 512MX64 DDR DRAM MODULE with 64-bit memory width. Operating at 1.2V, it features synchronous mode and self-refresh capability. Ideal for applications requiring high-speed data processing in microelectronic assemblies.

Median Price

$9.000

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Star Micro Inc

. 71 parts In-Stock

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$7.000

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Amazon

USA . 54 parts In-Stock

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$9.000

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$9.000

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eBay

USA . 92 parts In-Stock

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$12.000

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Chip Stock

USA . 17,100 parts In-Stock

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Vyrian

USA . 2,316 parts In-Stock

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Digiode

USA . 1,782 parts In-Stock

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Nova Conductors

Japan . 87 parts In-Stock

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Distributors (Availability)

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Ampacity Inc.

Singapore . 1,480 parts In-Stock

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$9.000

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1,480

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AZTECH Wire

Italy . 783 parts In-Stock

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$15.470

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Argo Parts USA

USA . 4,660 parts In-Stock

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Continental Prestige Electronics

USA . 4,452 parts In-Stock

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Aranea Global

USA . 1,000 parts In-Stock

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Corphita

USA . 283 parts In-Stock

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Overview

Enhance your system's performance with the MTA4ATF51264AZ-2G3B1 from Micron Technology. Known for their high-quality products, Micron Technology delivers top-notch DRAM modules that are perfect for a wide range of applications. Whether you're looking to boost your computer's speed or enhance your gaming experience, this DDR DRAM MODULE is the perfect solution. With a nominal supply voltage of 1.2V and a self-refresh feature, this module offers exceptional value and benefits to customers. Upgrade your device today and experience the difference Micron Technology can make!

Feature Benefit Bullets

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient stacking and organization of multiple modules in a system, optimizing space usage.

Operating Mode: SYNCHRONOUS

Synchronous operation ensures precise timing and coordination between the memory controller and the DRAM module, resulting in faster and more reliable data transfer.

Self Refresh: YES

Self-refresh capability allows the DRAM module to conserve power by automatically refreshing data without requiring external commands, enhancing energy efficiency.

Nominal Supply Voltage / Vsup (V): 1.2

Operating at a nominal supply voltage of 1.2V offers a balance between performance and power consumption, making it suitable for various applications.

No. of Terminals: 288

Having 288 terminals enables efficient connectivity and communication between the DRAM module and the system, ensuring seamless data access and transfer.

Maximum Operating Temperature: 85 °C

With a maximum operating temperature of 85°C, this DRAM module can withstand elevated temperatures, making it suitable for use in demanding environments.

Organization: 512MX64

The 512MX64 organization offers a high memory capacity and data width, allowing for fast and efficient data processing and storage.

Minimum Operating Temperature: 0 °C

Being operational at a minimum temperature of 0°C ensures reliable performance even in cold environments, expanding the usability of the DRAM module.

Terminal Position: DUAL

The dual terminal position provides redundancy and improved reliability in data transfer, minimizing the risk of data loss or transmission errors.

Width: 2.7 mm

The compact width of 2.7mm allows for easy integration and installation of the DRAM module in systems with limited space, enhancing versatility.

No. of Words: 536870912 words

With a large word count of 536870912, this DRAM module offers ample storage capacity for handling extensive data processing and multitasking requirements.

Memory Width: 64

A memory width of 64 bits enables efficient data transfer and processing, enhancing the overall performance and speed of the DRAM module.

Memory Density: 34359738368 bit

High memory density of 34359738368 bits allows for storing a large volume of data in a compact form factor, making it suitable for memory-intensive applications.

Memory IC Type: DDR DRAM MODULE

Utilizing DDR DRAM technology ensures fast data access and transfer rates, enhancing system performance and responsiveness.

Technical Specifications

DRAM MTA4ATF51264AZ-2G3B1 attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

SINGLE BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH; WD-MAX

JESD-30 Code:

R-XDMA-N288

Length:

133.35 mm

Memory Density:

34359738368 bit

Memory IC Type:

Memory Width:

64

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

288

No. of Words:

536870912 words

No. of Words Code:

512M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

0 Cel

Organization:

512MX64

Package Body Material:

UNSPECIFIED

Package Code:

Package Shape:

Package Style (Meter):

MICROELECTRONIC ASSEMBLY

Maximum Seated Height:

31.4 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.26 V

Minimum Supply Voltage (Vsup):

1.14 V

Nominal Supply Voltage / Vsup (V):

1.2

Surface Mount:

NO

Technology:

CMOS

Temperature Grade:

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Width:

2.7 mm

Trade Compliance

MTA4ATF51264AZ-2G3B1 Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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