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BSP89L6327XT

Infineon Technologies

BSP89L6327XT by Infineon Technologies

BSP89L6327XT by Infineon is a N-CHANNEL FET with 240V DS breakdown voltage, 1.4A IDM, and 6ohm RDS(on). It's used in enhancement mode operation for applications requiring small outline packages like power management systems.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Vyrian

USA . 1,219 parts In-Stock

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VNN

France . 936 parts In-Stock

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Nova Conductors

Japan . 500 parts In-Stock

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Digiode

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Modulus Dynamics

Lithuania . 7,633 parts In-Stock

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$1.449

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$1.391

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$1.333

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AZTECH Wire

Italy . 242 parts In-Stock

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$15.766

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Ampacity Inc.

Singapore . 1,461 parts In-Stock

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Argo Parts USA

USA . 4,814 parts In-Stock

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Continental Prestige Electronics

USA . 4,762 parts In-Stock

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Corphita

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Aranea Global

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Overview

Unlock the power of the BSP89L6327XT by Infineon Technologies, a top-quality N-Channel Power Field Effect Transistor with a built-in diode. Infineon Technologies is renowned for its cutting-edge technology and reliability. This versatile transistor is perfect for a wide range of applications, offering enhanced performance and efficiency. Experience the benefits of seamless operation, high durability, and exceptional value with this high-performing component. Take your projects to the next level with the BSP89L6327XT!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material for the package body ensures durability and protects the internal components of the FET from external elements, making it a reliable choice for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility and conductivity compared to P-channel FETs, offering better performance in terms of efficiency and speed.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode in the FET helps in protecting the circuit from voltage spikes or reverse current, enhancing the overall reliability of the system.

Surface Mount: YES

Being surface mountable makes the FET easy to solder onto the PCB, saving space and allowing for a more compact design in electronic circuits.

Minimum DS Breakdown Voltage: 240 V

The high breakdown voltage ensures that the FET can handle high voltage applications without the risk of damage or failure, making it suitable for power electronics.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient placement on the PCB, optimizing space utilization and airflow within the system.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer easier control over the flow of current in the circuit, providing better performance and efficiency in various applications.

Maximum Pulsed Drain Current (IDM): 1.4 A

The high pulsed drain current rating allows the FET to handle short-duration high current spikes without overheating or failing, ensuring reliable operation under varying load conditions.

No. of Terminals: 4

Having 4 terminals provides flexibility in circuit design and allows for better current handling capabilities, making it suitable for a wide range of applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers low leakage current and high efficiency, making the FET ideal for power management and switching applications.

Transistor Element Material: SILICON

Silicon-based FETs offer good thermal conductivity, high temperature tolerance, and reliable performance, making them a popular choice in various electronic devices.

Terminal Finish: MATTE TIN

Matte tin finish provides good solderability and corrosion resistance, ensuring stable electrical connections and long-term reliability in harsh operating environments.

Maximum Drain Current (ID): 0.35 A

The maximum drain current rating specifies the continuous current that the FET can handle without exceeding its thermal limits, ensuring stable and safe operation.

Maximum Drain-Source On Resistance: 6 ohm

Low drain-source on resistance results in minimal power loss and heat generation during operation, improving overall efficiency and performance of the FET.

Terminal Position: DUAL

Dual terminal position allows for versatile circuit configurations and current handling capabilities, offering flexibility in design and application requirements.

Case Connection: DRAIN

The case connection at the drain terminal helps in efficient heat dissipation, ensuring proper thermal management and extending the lifespan of the FET.

Maximum Time At Peak Reflow Temperature (s): 40

The specified maximum time at peak reflow temperature ensures proper soldering of the FET onto the PCB, preventing damage due to overheating during the assembly process.

Peak Reflow Temperature °C: 260

The high peak reflow temperature ensures reliable soldering and mechanical stability of the FET on the PCB, making it suitable for lead-free soldering processes.

Technical Specifications

Power Field Effect Transistors (FET) BSP89L6327XT attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Infineon Technologies

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

240 V

Maximum Drain Current (ID):

.35 A

Maximum Drain-Source On Resistance:

6 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G4

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

1.4 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Element Material:

SILICON

Trade Compliance

BSP89L6327XT Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Infineon Technologies

Infineon Technologies AG is a leading global semiconductor manufacturer and provider of comprehensive solutions for automotive, industrial, and consumer applications. Founded in 1999, the company has grown to become one of the largest semiconductor manufacturers in Europe. Infineon is headquartered in Neubiberg, Germany with operations across countries in Europe and Asia Pacific. Infineon provides microelectronics products that address many of today's societal challenges affecting energy efficiency, mobility, security and connectivity. Over the past two decades Infineon has become a major player in the semiconductor industry with an impressive portfolio of innovative technologies. As one of only four companies that produce DRAM chips for automobiles, Infineon produces cutting-edge processors for use in advanced driver assistance systems (ADAS). Likewise, they specialize in providing advanced embedded secure microcontrollers that are essential for connected devices. Furthermore, they offer integrated circuit solutions for industrial power control such as motor controllers and embedded gate drivers.

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Management team

CEO

Jochen Hanebeck

Chief Financial Officer

Sven Schneider

Chief Marketing Officer

Andreas Urschitz

Manufacturer fab locations 19

Fab name Location Fab Initiation Wafer Capacity

Villach 300mm

Fabrication

Fab Initiation

2011

Austria

Villach

Wafer Capacity

11,000

2011

11,000

Kulim 2

Fabrication

Fab Initiation

2016

Malaysia

Kulim

Wafer Capacity

79,500

2016

79,500

Dresden - Module 3

Fabrication

Fab Initiation

1999

Germany

Dresden

Wafer Capacity

58,000

1999

58,000

Villach Building

Fabrication

Fab Initiation

2016

Austria

Villach

Wafer Capacity

2,000

2016

2,000

Regensburg

Fabrication

Fab Initiation

1986

Germany

Regensburg

Wafer Capacity

60,000

1986

60,000

Dresden 200 - Module 1

Fabrication

Fab Initiation

1995

Germany

Dresden

Wafer Capacity

28,000

1995

28,000

Dresden 200 - Module 2

Fabrication

Fab Initiation

1996

Germany

Dresden

Wafer Capacity

28,000

1996

28,000

Building 38

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Building 47

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Kulim 1

Fabrication

Fab Initiation

2006

Malaysia

Kulim

Wafer Capacity

110,000

2006

110,000

Mesa Facility

Fabrication

Fab Initiation

1990

USA

Mesa

Wafer Capacity

3,000

1990

3,000

Villach 150mm

Fabrication

Fab Initiation

1981

Austria

Villach

Wafer Capacity

35,000

1981

35,000

Villach 200mm

Fabrication

Fab Initiation

1995

Austria

Villach

Wafer Capacity

68,000

1995

68,000

Temecula

Fabrication

Fab Initiation

1995

USA

Temecula

Wafer Capacity

30,000

1995

30,000

Villach 300mm

Fabrication

Fab Initiation

2021

Austria

Villach

Wafer Capacity

2021

Villach 150mm

Fabrication

Fab Initiation

2018

Austria

Villach

Wafer Capacity

5,000

2018

5,000

Kulim 3

Fabrication

Fab Initiation

2024

Malaysia

Kulim

Wafer Capacity

2024

Fab 25

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

31,000

1995

31,000

Dresden - Module 4

Fabrication

Fab Initiation

2026

Germany

Dresden

Wafer Capacity

2026

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