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RM2012B-102/502-PBVW10

Susumu

RM2012B-102/502-PBVW10 by Susumu

The Susumu RM2012B-102/502-PBVW10 is a thin film resistor array with 0.05W power dissipation and 85°C rated temperature. Ideal for surface mount applications, it features two functions with resistances of 1000 ohm and 5000 ohm, offering high precision with a tolerance of 0.1%.

Median Price

$1.930

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

DigiKey

USA . 1,880 parts In-Stock

1+ parts

$1.930

100+ parts

$0.894

1k+ parts

$0.684

10k+ parts

$0.552

1,880

$1.930

$0.894

$0.684

$0.552

Distributors (In-Stock)

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Vyrian

USA . 7,047 parts In-Stock

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7,047

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Nova Conductors

Japan . 122 parts In-Stock

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122

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Corohmni

South Africa . 486 parts In-Stock

1+ parts

$0.558

100+ parts

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486

$0.558

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Authorized Procurement Solutions

USA . 10,000 parts In-Stock

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10,000

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Netroflash

USA . 4,000 parts In-Stock

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Argo Parts USA

USA . 3,919 parts In-Stock

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Continental Prestige Electronics

USA . 963 parts In-Stock

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963

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Overview

Elevate your electronic designs with the RM2012B-102/502-PBVW10 resistor network by Susumu. As a leading manufacturer in the industry, Susumu delivers unmatched quality and reliability in their components. Ideal for a wide range of applications, this thin film resistor network offers precise performance and stability. With a low power dissipation and high temperature rating, this isolated network provides exceptional value and benefits to customers seeking top-notch electronic solutions. Upgrade your designs today with the RM2012B-102/502-PBVW10 and experience the difference that Susumu's expertise can make.

Feature Benefit Bullets

Power Dissipation: 0.05 W

The low power dissipation makes this resistor network energy efficient and suitable for applications where power consumption is a concern.

Rated Temperature: 85 °C

With a rated temperature of 85°C, this resistor network can operate reliably in a wide range of temperature conditions.

Technology: THIN FILM

The thin film technology used in this resistor network provides high precision and stability, making it ideal for applications requiring accuracy.

Network Type: ISOLATED

The isolated network type ensures that each resistor element operates independently, reducing the chances of interference and improving overall circuit performance.

Temperature Coef Tracking: 5 ppm/°C

With a low temperature coefficient tracking of 5 ppm per °C, this resistor network maintains consistent performance over a wide temperature range.

Technical Specifications

Resistor Networks & Arrays RM2012B-102/502-PBVW10 attributes and parameters. Explore more Resistor Networks & Arrays devices from Susumu

Specs

Construction:

Rectangular

Element Power Dissipation:

.05 W

First Element Resistance:

1000 ohm

JESD-609 Code:

e3

Mounting Type:

Network Type:

ISOLATED

No. of Elements:

1

No. of Functions:

2

No. of Terminals:

4

Maximum Operating Temperature:

Minimum Operating Temperature:

-55 Cel

Height (Package):

.45 mm

Length (Package):

2 mm

Shape (Package):

RECTANGULAR PACKAGE

Package Style (Meter):

SMT

Width (Package):

1.25 mm

Packing Method:

TR

Rated Power Dissipation (P):

Rated Temperature:

85 Cel

Reference Standard:

AEC-Q200

Resistor Type:

Second or Last Element Resistance:

5000 ohm

Size Code:

0805

Sub-Category:

Array/Network Resistors

Technology:

THIN FILM

Temperature Coef (ppm/Cel):

25

Temperature Coef Tracking:

5 ppm/Cel

Terminal Finish:

MATTE TIN

Terminal Shape:

WRAPAROUND

Tolerance:

Trade Compliance

RM2012B-102/502-PBVW10 Resistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8533.21.00.20

SB

8533.21.00.25

Manufacturer Highlights

Susumu

As a specialist in thin film technology and resistors, we can turn your ideas into reality. Since our founding in 1964, we have pursued the originality of thin films through research into thin film technology and product development. A corporate culture that dedicates itself to commercialization in the face of difficulties, self-confidence cultivated through repeated basic research, and unique development capabilities enabled by experienced thin-film technology. This is the reason why Susumu is able to acquire a global position and trust. We have the ability to integrate organically while improving each technology. In particular, our thin film deposition technology is backed by our high level of basic research, and there are things that surpass our competitors. Thin film formation technology (plasma reaction method, sputtering, vacuum deposition method, etc.) Fine photo-etching technology (flat/curved surface etching) Microlaser technology (pattern generation, trimming, scribing, etc.) High-density packaging technology (BGA, ultra-small chips, etc.)

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