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STP21NM60N

STMicroelectronics

STP21NM60N by STMicroelectronics

STP21NM60N by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 600V breakdown voltage, 68A pulsed drain current, and operates at up to 150 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 7,911 parts In-Stock

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7,911

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Digiode

USA . 3,864 parts In-Stock

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3,864

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Anansix

USA . 1,669 parts In-Stock

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1,669

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Inventory MP

USA . 49 parts In-Stock

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49

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Bristol Electronics

USA . 49 parts In-Stock

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49

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 687 parts In-Stock

1+ parts

$1.628

100+ parts

-

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$1.466

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687

$1.628

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$1.466

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MKK Technologies

India . 2,154 parts In-Stock

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$3.062

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2,154

$3.062

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DigiPath Technology Company

USA . 2,154 parts In-Stock

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$3.062

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2,154

$3.062

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AZTECH Wire

Italy . 941 parts In-Stock

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$11.350

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941

$11.350

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Kepictronics

USA . 44,000 parts In-Stock

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44,000

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Authorized Procurement Solutions

USA . 15,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,612 parts In-Stock

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Corphita

USA . 4,330 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,222 parts In-Stock

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Parana Technologies

USA . 1,861 parts In-Stock

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$1.947

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$1.947

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RC Electronics

USA . 850 parts In-Stock

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850

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Overview

Unlock the potential of your projects with the STP21NM60N from STMicroelectronics, a leader in innovative semiconductor solutions. This high-quality N-channel power FET excels in switching applications, offering robust performance with impressive efficiency. Designed for reliability and built to withstand extreme conditions, it ensures longevity in various electronic systems, from industrial equipment to renewable energy applications. Experience superior value and peace of mind knowing you're backed by a trusted manufacturer dedicated to excellence.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The robust plastic/epoxy package provides durability and reliability, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel configuration allows for efficient switching and better conductivity, enhancing performance in power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode adds protection against voltage spikes, making this FET ideal for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient operation in power management systems.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage of 600 V allows this FET to be used in high voltage applications without failure.

Package Shape: RECTANGULAR

The rectangular shape facilitates easy integration into PCB designs, optimizing space and layout.

Terminal Form: THROUGH-HOLE

Through-hole terminals ensure strong mechanical connections and are easy to solder, improving reliability in assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation results in high efficiency and low power loss, making the FET suitable for modern power circuits.

Maximum Pulsed Drain Current (IDM): 68 A

This high pulsed drain current capability allows the FET to handle large current spikes during operation.

Avalanche Energy Rating (EAS): 610 mJ

A high avalanche energy rating provides reliability in transient conditions, ensuring stable operation under difficult scenarios.

Maximum Drain Current (Abs) (ID): 17 A

The maximum drain current rating of 17 A makes it suitable for a variety of medium-power applications.

No. of Terminals: 3

The 3-terminal design simplifies circuit configuration and is compatible with standard circuit designs.

Maximum Power Dissipation (Abs): 140 W

With a high maximum power dissipation rating, this FET can handle significant power loads without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mount style provides stability and ease of installation in various electronic setups.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology enhances switching speed and reduces power consumption in electronic circuits.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures reliable performance even in demanding thermal environments.

Transistor Element Material: SILICON

Silicon material offers excellent electrical properties and is the most widely used semiconductor for FETs.

Terminal Finish: TIN

Tin finish enhances corrosion resistance and improves solderability, ensuring reliable connections.

Maximum Drain Current (ID): 17 A

With a consistent maximum drain current capacity, this FET can efficiently manage power flow with minimal loss.

Maximum Drain-Source On Resistance: 0.22 ohm

Low on-resistance minimizes power losses during operation, improving overall efficiency in applications.

Terminal Position: SINGLE

The single terminal position design allows for easy layout in PCB designs, optimizing space requirements.

Technical Specifications

Power Field Effect Transistors (FET) STP21NM60N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

610 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

17 A

Maximum Drain Current (ID):

17 A

Maximum Drain-Source On Resistance:

.22 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

68 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP21NM60N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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