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STP21NM50N

STMicroelectronics

STP21NM50N by STMicroelectronics

STP21NM50N by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a 500V breakdown voltage and 18A max drain current. It operates in enhancement mode with a low on-resistance of 0.19Ω. Designed for high power dissipation (140W), it's perfect for efficient power management.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,834 parts In-Stock

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4,834

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Vyrian

USA . 3,489 parts In-Stock

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3,489

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Anansix

USA . 1,847 parts In-Stock

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1,847

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Cyclops Electronics Ltd

UK . 20 parts In-Stock

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Prism Electronics

USA . 2 parts In-Stock

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,265 parts In-Stock

1+ parts

$0.471

100+ parts

-

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$0.424

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2,265

$0.471

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$0.424

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MKK Technologies

India . 417 parts In-Stock

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$0.886

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417

$0.886

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DigiPath Technology Company

USA . 417 parts In-Stock

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$0.886

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417

$0.886

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AZTECH Wire

Italy . 467 parts In-Stock

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$15.490

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467

$15.490

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Authorized Procurement Solutions

USA . 60,000 parts In-Stock

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60,000

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Alle Elektronik GmbH

Germany . 4,748 parts In-Stock

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4,748

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Corphita

USA . 2,771 parts In-Stock

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2,771

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Kepictronics

USA . 1,000 parts In-Stock

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1,000

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Parana Technologies

USA . 87 parts In-Stock

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$0.563

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87

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$0.563

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Perfect Parts

USA . 2 parts In-Stock

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2

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Overview

Unlock the potential of your projects with the STP21NM50N from STMicroelectronics, a leader in power technology. This robust N-channel FET offers exceptional performance and reliability, making it ideal for various switching applications in industrial and consumer electronics. With its impressive voltage handling and built-in diode, you can trust in efficient power management that enhances system longevity and efficiency. Elevate your designs and enjoy peace of mind with STMicroelectronics' commitment to quality and innovation.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package provides good protection and durability, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for higher electron mobility, resulting in better performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode adds protection against reverse voltage, enhancing reliability in demanding environments.

Transistor Application: SWITCHING

Optimized for switching applications, this transistor provides efficient and fast operation in electronic circuits.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage ensures reliability in high-voltage applications, reducing the risk of device failure.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient mounting and thermal management in various circuit designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals facilitate strong mechanical connections, ideal for high-stress applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation offers better performance characteristics and efficiency compared to depletion mode FETs.

Maximum Pulsed Drain Current (IDM): 72 A

A high pulsed drain current allows the FET to handle peak loads, making it versatile for various applications.

Avalanche Energy Rating (EAS): 480 mJ

The ability to withstand high avalanche energy enhances the device's durability and reliability in adverse conditions.

Maximum Drain Current (Abs) (ID): 18 A

This maximum drain current rating supports robust operation in demanding applications without overheating.

No. of Terminals: 3

A 3-terminal configuration simplifies circuit design and integration into various systems.

Maximum Power Dissipation (Abs): 140 W

High power dissipation capability ensures effective heat management, allowing for reliable long-term operation.

Package Style (Meter): FLANGE MOUNT

Flange mount design provides enhanced stability and heat dissipation, suitable for industrial applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers low on-resistance and high-speed operation, which is crucial for efficient switching.

Maximum Operating Temperature: 150 °C

A high operating temperature rating allows the FET to function in extreme environments without failure.

Transistor Element Material: SILICON

Silicon is a well-established material for FETs, providing reliability and efficiency in electronic components.

Terminal Finish: TIN

Tin finish improves solderability and corrosion resistance, ensuring reliable connections in electronics.

Maximum Drain Current (ID): 18 A

The consistency of the drain current rating reinforces the FET's reliability in both standard and extreme conditions.

Maximum Drain-Source On Resistance: 0.19 ohm

0.19 ohm on-resistance minimizes power loss during operation, enhancing overall system efficiency.

Terminal Position: SINGLE

A single terminal position ensures simplified circuit integration and space efficiency in design.

Technical Specifications

Power Field Effect Transistors (FET) STP21NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

480 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

18 A

Maximum Drain Current (ID):

18 A

Maximum Drain-Source On Resistance:

.19 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

72 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP21NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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