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STE250N05

STMicroelectronics

STE250N05 by STMicroelectronics

STE250N05 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 250 A, a breakdown voltage of 50 V, and operates at up to 150 °C. Ideal for high-power circuits with low on-resistance (0.004 Ω).

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,573 parts In-Stock

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4,573

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Digiode

USA . 2,788 parts In-Stock

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2,788

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Anansix

USA . 271 parts In-Stock

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271

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ECAB

Sweden . 10 parts In-Stock

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IDEA Electronic Components Group

UK . 1,429 parts In-Stock

1+ parts

$1.397

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$1.257

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1,429

$1.397

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$1.257

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MKK Technologies

India . 2,360 parts In-Stock

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$2.626

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$2.626

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DigiPath Technology Company

USA . 2,360 parts In-Stock

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$2.626

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2,360

$2.626

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Corphita

USA . 4,908 parts In-Stock

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4,908

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Kepictronics

USA . 266 parts In-Stock

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266

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Parana Technologies

USA . 190 parts In-Stock

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$1.670

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190

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$1.670

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Assy Fe

Spain . 7 parts In-Stock

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Overview

Elevate your power management solutions with the STE250N05 from STMicroelectronics, a trusted leader in semiconductor innovation. This N-channel power FET combines superior efficiency with excellent thermal performance, making it ideal for demanding switching applications. Engineered for reliability, its robust design ensures optimal functionality across a range of industries, empowering you to achieve greater performance and energy savings effortlessly. Choose STE250N05 for unparalleled quality and value!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material ensures a lightweight and durable package, making it ideal for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency compared to P-channel devices, making it a strong choice for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides enhanced protection against reverse polarity, improving reliability in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently handle high-speed operations, contributing to faster electronic systems.

Minimum DS Breakdown Voltage: 50 V

This FET can handle a minimum breakdown voltage of 50 V, allowing it to operate safely in high-voltage environments.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy integration into various circuit designs, optimizing space utilization.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control and efficiency, making the FET responsive and ideal for precise applications.

Maximum Pulsed Drain Current (IDM): 750 A

The ability to handle pulsed drain currents up to 750 A makes this FET suitable for applications requiring high peak currents.

Maximum Drain Current (Abs) (ID): 250 A

With a maximum continuous drain current rating of 250 A, this FET can handle substantial loads, making it excellent for power management.

No. of Terminals: 4

Having 4 terminals facilitates flexible circuit design options and efficient connections in complex electronic systems.

Maximum Power Dissipation (Abs): 450 W

With a power dissipation capability of 450 W, this FET can operate effectively without overheating, enhancing reliability.

Package Style (Meter): FLANGE MOUNT

Flange mount design provides secure physical attachment, improving thermal management and mechanical stability in applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures high efficiency and low power consumption, making this FET an excellent choice for energy-sensitive applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C allows the FET to withstand harsh environments, ensuring reliable performance in demanding conditions.

Transistor Element Material: SILICON

Silicon is a proven material for FETs, providing reliability and performance that meets the industry's high standards.

Maximum Drain Current (ID): 250 A

This specification reinforces the capability of handling substantial currents, making it versatile for various power applications.

Maximum Drain-Source On Resistance: 0.004 ohm

Low on-resistance translates to minimal power loss during operation, enhancing overall efficiency and performance in circuit design.

Terminal Position: UPPER

Upper terminal positioning facilitates ease of layout in PCB designs, enhancing accessibility for connections.

Case Connection: ISOLATED

An isolated case connection reduces the risk of short circuits and enhances safety in operation, making it reliable in a range of applications.

Reference Standard: UL RECOGNIZED

Being UL recognized signifies compliance with stringent safety standards, ensuring users can trust the product's quality and reliability.

Technical Specifications

Power Field Effect Transistors (FET) STE250N05 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

50 V

Maximum Drain Current (Abs) (ID):

250 A

Maximum Drain Current (ID):

250 A

Maximum Drain-Source On Resistance:

.004 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PUFM-X4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

750 A

Qualification:

Not Qualified

Reference Standard:

UL RECOGNIZED

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STE250N05 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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