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STD19NF20

STMicroelectronics

STD19NF20 by STMicroelectronics

STD19NF20 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 15 A, a breakdown voltage of 200 V, and low on-resistance of 0.16 Ω. Ideal for power management in compact electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 5,748 parts In-Stock

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5,748

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Digiode

USA . 1,055 parts In-Stock

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1,055

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Anansix

USA . 932 parts In-Stock

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932

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IDEA Electronic Components Group

UK . 2,180 parts In-Stock

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$0.299

100+ parts

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$0.269

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2,180

$0.299

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$0.269

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MKK Technologies

India . 172 parts In-Stock

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$0.562

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172

$0.562

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DigiPath Technology Company

USA . 172 parts In-Stock

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$0.562

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172

$0.562

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AZTECH Wire

Italy . 160 parts In-Stock

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$12.720

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160

$12.720

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Alle Elektronik GmbH

Germany . 4,511 parts In-Stock

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4,511

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Parana Technologies

USA . 2,143 parts In-Stock

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$0.358

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2,143

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$0.358

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Corphita

USA . 564 parts In-Stock

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564

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Kepictronics

USA . 449 parts In-Stock

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449

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Overview

Unlock the power of efficiency with the STD19NF20 from STMicroelectronics—a leader in innovative semiconductor solutions. This robust N-channel FET is designed for seamless switching applications, delivering exceptional performance and reliability. With a compact surface-mount package and built-in diode, it ensures superior thermal management and space-saving benefits. Elevate your projects with a trusted component that enhances energy savings and operational longevity, empowering your designs to achieve new heights.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and protection against environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for better conductivity and higher efficiency in switching applications, which makes this product advantageous for power management.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode provides added protection and prevents potential damage from reverse operations, enhancing reliability in circuit designs.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers efficient performance in controlling power and signal flow in electronic circuits.

Surface Mount: YES

The surface mount design allows for compact circuit board layouts, making it ideal for modern electronics that require space efficiency.

Minimum DS Breakdown Voltage: 200 V

A high breakdown voltage of 200 V ensures that this FET can handle demanding applications without the risk of failure.

Package Shape: RECTANGULAR

The rectangular shape provides a standard footprint, making it easy to integrate into existing designs while maintaining a low profile.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and assembly, ensuring reliable electrical connections in various applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for efficient switching and control, improving overall circuit performance and power efficiency.

Maximum Pulsed Drain Current (IDM): 60 A

With a high pulsed drain current rating, this FET can cope with high-demand applications, ensuring robust performance during intensive operations.

Avalanche Energy Rating (EAS): 110 mJ

The effective avalanche energy rating indicates durable performance under adverse conditions, protecting the device from transient events.

No. of Terminals: 2

A two-terminal design simplifies circuit integration and minimizes potential points of failure, contributing to reliable operation.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for space-saving designs, perfect for compact electronic applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides fast switching speeds and low gate drive power, resulting in improved efficiency for electronic applications.

Transistor Element Material: SILICON

Silicon as the base material ensures widespread compatibility and reliability, making this FET a trusted choice in semiconductor technology.

Minimum Operating Temperature: -55 °C

A low minimum operating temperature ensures that this FET can function in extreme conditions, widening its range of applications.

Maximum Drain Current (ID): 15 A

The maximum drain current of 15 A signifies that the FET is capable of handling substantial loads, which is vital for high-power applications.

Maximum Drain-Source On Resistance: 0.16 ohm

Low on-resistance contributes to minimal power loss during operation, improving overall circuit efficiency and thermal performance.

Terminal Position: SINGLE

The single terminal position reduces layout complexity and enhances assembly efficiency in circuit designs.

Case Connection: DRAIN

Direct connection to the drain improves electrical performance and helps in better heat dissipation, which is essential in power applications.

Technical Specifications

Power Field Effect Transistors (FET) STD19NF20 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

110 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (ID):

15 A

Maximum Drain-Source On Resistance:

.16 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

60 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD19NF20 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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