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FDB28N30

Onsemi

FDB28N30 by Onsemi

FDB28N30 by Onsemi is a N-CHANNEL Power FET with 300V DS Breakdown Voltage and 28A Drain Current. Ideal for SWITCHING applications, it features a built-in DIODE, 112A Pulsed Drain Current, and 250W Power Dissipation in a RECTANGULAR package.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

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Chip Stock

USA . 10,500 parts In-Stock

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Vyrian

USA . 2,608 parts In-Stock

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Digiode

USA . 2,544 parts In-Stock

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Nova Conductors

Japan . 18 parts In-Stock

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ComSIT Distribution GmbH

Germany . 10 parts In-Stock

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Ampacity Inc.

Singapore . 529 parts In-Stock

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$64.050

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Problanco Electronics

Mexico . 7,692 parts In-Stock

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SupplyDigital Components

Austria . 5,824 parts In-Stock

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TANS Electronics

Latvia . 3,851 parts In-Stock

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Kulean Microsystems

USA . 2,627 parts In-Stock

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Aranea Global

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Corphita

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South Africa . 160 parts In-Stock

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Türkiye . 1 parts In-Stock

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Overview

Experience the power and reliability of the FDB28N30 by Onsemi, a top-of-the-line Power Field Effect Transistor perfect for your switching applications. With a maximum operating temperature of 150°C and an impressive maximum pulsing drain current of 112A, this N-channel transistor offers unrivaled performance and durability. Whether you're in need of high power dissipation or fast turn-on times, this enhancement mode transistor has got you covered. Trust in Onsemi's expertise and invest in the FDB28N30 for all your power needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable and reliable material for long-lasting performance.

Polarity or Channel Type: N-CHANNEL

Efficient N-channel design for effective power management.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode for added functionality and convenience.

Transistor Application: SWITCHING

Ideal for switching applications, providing efficient control.

Surface Mount: YES

Easy to mount on PCBs, saving time and effort during assembly.

Minimum DS Breakdown Voltage: 300 V

High breakdown voltage for reliable operation in various conditions.

Maximum Pulsed Drain Current (IDM): 112 A

High current rating for handling heavy loads during peak operation.

Maximum Power Dissipation (Abs): 250 W

High power dissipation capability for handling high power applications.

Maximum Operating Temperature: 150 °C

Wide temperature range for versatile usage in different environments.

Maximum Turn On Time (ton): 360 ns

Fast turn-on time for quick response and efficient operation.

Maximum Turn Off Time (toff): 316 ns

Fast turn-off time for precise control and performance.

Maximum Drain-Source On Resistance: 0.129 ohm

Low on-resistance for minimal power loss and improved efficiency.

Technical Specifications

Power Field Effect Transistors (FET) FDB28N30 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

588 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

300 V

Maximum Drain Current (Abs) (ID):

28 A

Maximum Drain Current (ID):

28 A

Maximum Drain-Source On Resistance:

.129 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

50 pF

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

112 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

316 ns

Maximum Turn On Time (ton):

360 ns

Trade Compliance

FDB28N30 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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