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IPI65R190CFD

Infineon Technologies

IPI65R190CFD by Infineon Technologies

IPI65R190CFD by Infineon is a N-CHANNEL FET with 650V DS breakdown voltage and 57.2A pulsed drain current, ideal for switching applications. It features a built-in diode, 0.19 ohm RDS(on), and 151W power dissipation in a plastic/epoxy package. Operating from -55 to 150 °C, it's suitable for high-power enhancement mode operations.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 699 parts In-Stock

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699

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Digiode

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Nova Conductors

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Modulus Dynamics

Lithuania . 5,211 parts In-Stock

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$1.610

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$1.546

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$1.481

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AZTECH Wire

Italy . 682 parts In-Stock

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Ampacity Inc.

Singapore . 139 parts In-Stock

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Lixinc

USA . 17,245 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,850 parts In-Stock

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Argo Parts USA

USA . 4,240 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,900 parts In-Stock

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Continental Prestige Electronics

USA . 3,177 parts In-Stock

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Authorized Procurement Solutions

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Corphita

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Bastille Electronics

Australia . 500 parts In-Stock

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Overview

Unlock the power of innovation with the IPI65R190CFD by Infineon Technologies. As a leading manufacturer in the industry, Infineon delivers top-quality Power Field Effect Transistors (FET) like no other. Suitable for switching applications, this N-CHANNEL transistor offers a built-in diode for enhanced performance. With a high breakdown voltage of 650V and maximum drain current of 17.5A, this transistor is designed to handle the toughest tasks with ease. Trust Infineon to provide reliable and efficient solutions for all your power needs. Upgrade to the IPI65R190CFD and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Ensures durability and reliability in various operating conditions.

Polarity or Channel Type: N-CHANNEL

Provides better conductivity and efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplified design with integrated diode for improved performance.

Minimum DS Breakdown Voltage: 650 V

Withstands high voltage applications, adding to product's versatility.

Maximum Pulsed Drain Current (IDM): 57.2 A

Capable of handling high currents during pulsed operation, suitable for demanding tasks.

Maximum Power Dissipation (Abs): 151 W

Efficiently dissipates power to prevent overheating and ensure long-term reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Modern MOSFET technology for enhanced performance and efficiency.

Maximum Operating Temperature: 150 °C

Can operate in high-temperature environments, suitable for industrial applications.

Maximum Drain-Source On Resistance: 0.19 ohm

Low on-resistance for minimal power loss and improved efficiency.

Technical Specifications

Power Field Effect Transistors (FET) IPI65R190CFD attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Infineon Technologies

Specs

Avalanche Energy Rating (EAS):

484 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

17.5 A

Maximum Drain Current (ID):

17.5 A

Maximum Drain-Source On Resistance:

.19 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

57.2 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

IPI65R190CFD Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Infineon Technologies

Infineon Technologies AG is a leading global semiconductor manufacturer and provider of comprehensive solutions for automotive, industrial, and consumer applications. Founded in 1999, the company has grown to become one of the largest semiconductor manufacturers in Europe. Infineon is headquartered in Neubiberg, Germany with operations across countries in Europe and Asia Pacific. Infineon provides microelectronics products that address many of today's societal challenges affecting energy efficiency, mobility, security and connectivity. Over the past two decades Infineon has become a major player in the semiconductor industry with an impressive portfolio of innovative technologies. As one of only four companies that produce DRAM chips for automobiles, Infineon produces cutting-edge processors for use in advanced driver assistance systems (ADAS). Likewise, they specialize in providing advanced embedded secure microcontrollers that are essential for connected devices. Furthermore, they offer integrated circuit solutions for industrial power control such as motor controllers and embedded gate drivers.

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Management team

CEO

Jochen Hanebeck

Chief Financial Officer

Sven Schneider

Chief Marketing Officer

Andreas Urschitz

Manufacturer fab locations 19

Fab name Location Fab Initiation Wafer Capacity

Villach 300mm

Fabrication

Fab Initiation

2011

Austria

Villach

Wafer Capacity

11,000

2011

11,000

Kulim 2

Fabrication

Fab Initiation

2016

Malaysia

Kulim

Wafer Capacity

79,500

2016

79,500

Dresden - Module 3

Fabrication

Fab Initiation

1999

Germany

Dresden

Wafer Capacity

58,000

1999

58,000

Villach Building

Fabrication

Fab Initiation

2016

Austria

Villach

Wafer Capacity

2,000

2016

2,000

Regensburg

Fabrication

Fab Initiation

1986

Germany

Regensburg

Wafer Capacity

60,000

1986

60,000

Dresden 200 - Module 1

Fabrication

Fab Initiation

1995

Germany

Dresden

Wafer Capacity

28,000

1995

28,000

Dresden 200 - Module 2

Fabrication

Fab Initiation

1996

Germany

Dresden

Wafer Capacity

28,000

1996

28,000

Building 38

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Building 47

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Kulim 1

Fabrication

Fab Initiation

2006

Malaysia

Kulim

Wafer Capacity

110,000

2006

110,000

Mesa Facility

Fabrication

Fab Initiation

1990

USA

Mesa

Wafer Capacity

3,000

1990

3,000

Villach 150mm

Fabrication

Fab Initiation

1981

Austria

Villach

Wafer Capacity

35,000

1981

35,000

Villach 200mm

Fabrication

Fab Initiation

1995

Austria

Villach

Wafer Capacity

68,000

1995

68,000

Temecula

Fabrication

Fab Initiation

1995

USA

Temecula

Wafer Capacity

30,000

1995

30,000

Villach 300mm

Fabrication

Fab Initiation

2021

Austria

Villach

Wafer Capacity

2021

Villach 150mm

Fabrication

Fab Initiation

2018

Austria

Villach

Wafer Capacity

5,000

2018

5,000

Kulim 3

Fabrication

Fab Initiation

2024

Malaysia

Kulim

Wafer Capacity

2024

Fab 25

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

31,000

1995

31,000

Dresden - Module 4

Fabrication

Fab Initiation

2026

Germany

Dresden

Wafer Capacity

2026

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