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STP120NH03L

STMicroelectronics

STP120NH03L by STMicroelectronics

STP120NH03L by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a max drain current of 60 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 3,681 parts In-Stock

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3,681

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Digiode

USA . 2,866 parts In-Stock

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Anansix

USA . 2,707 parts In-Stock

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2,707

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Distributors (Availability)

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Component Stockers USA

USA . 6,016 parts In-Stock

1+ parts

$0.970

100+ parts

$0.930

1k+ parts

$0.900

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-

6,016

$0.970

$0.930

$0.900

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IDEA Electronic Components Group

UK . 667 parts In-Stock

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$1.697

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-

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$1.528

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667

$1.697

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$1.528

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MKK Technologies

India . 111 parts In-Stock

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$3.192

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$3.192

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DigiPath Technology Company

USA . 111 parts In-Stock

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$3.192

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111

$3.192

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AZTECH Wire

Italy . 827 parts In-Stock

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$13.160

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827

$13.160

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Kepictronics

USA . 10,000 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,294 parts In-Stock

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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Corphita

USA . 2,004 parts In-Stock

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Parana Technologies

USA . 749 parts In-Stock

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$2.030

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Overview

Elevate your designs with the STP120NH03L from STMicroelectronics, a leader in innovation and reliability. This N-channel power FET is engineered for seamless switching, ensuring efficient performance across diverse applications like automotive, industrial, and renewable energy systems. Experience exceptional quality and durability while enjoying benefits like minimal power loss and robust thermal management. Choose STMicroelectronics for unparalleled excellence and empower your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package provides good thermal dissipation and withstands mechanical stress, making it suitable for various environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their higher electron mobility, resulting in better performance and efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easy integration in circuits requiring flyback protection, making it versatile for different applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET offers fast response times, making it ideal for power management and control.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V ensures reliability in high-voltage applications, providing a safety margin for circuit protection.

Package Shape: RECTANGULAR

Its rectangular package shape enables efficient board space management and a layout conducive to dense circuit designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals facilitate stable connections and are ideal for hand soldering, ensuring robust assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation ensures that the FET remains off until a gate voltage is applied, providing better control in applications.

Maximum Pulsed Drain Current (IDM): 240 A

With a high pulsed drain current capability, this FET can handle short duration peak loads, making it effective in signal processing.

Avalanche Energy Rating (EAS): 700 mJ

The 700 mJ avalanche energy rating allows it to safely absorb energy spikes, enhancing reliability in transient environments.

Maximum Drain Current (Abs) (ID): 60 A

A high maximum drain current ensures suitability for demanding applications like DC motor control and power supply regulation.

No. of Terminals: 3

A 3-terminal design simplifies circuit connections and reduces potential layout complications.

Maximum Power Dissipation (Abs): 115 W

The capability to dissipate up to 115W of power enables the FET to operate in high-power applications without overheating.

Package Style (Meter): FLANGE MOUNT

Flange mount style offers secure placement on PCBs, promoting stability and ease of assembly.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high-speed operation and lower power consumption, making this FET an energy-efficient choice.

Maximum Operating Temperature: 175 °C

A high operating temperature limit ensures reliability and performance in harsh thermal environments, reducing failure risks.

Transistor Element Material: SILICON

Silicon as the transistor element material provides a well-established platform for reliable and efficient operation in various applications.

Maximum Drain Current (ID): 60 A

The maximum drain current specification confirms the device's capability to drive substantial loads effectively.

Maximum Drain-Source On Resistance: 0.0105 ohm

Low on-resistance minimizes power loss during operation, enhancing the efficiency of power handling and switching.

Terminal Position: SINGLE

Single terminal position simplifies device placement and connections on a PCB, reducing complexity.

Case Connection: DRAIN

Drain case connection improves thermal performance, directing heat away from sensitive components, ensuring longevity.

Maximum Time At Peak Reflow Temperature (s): 40

With a maximum reflow time of 40 seconds, this FET can withstand standard soldering processes without degradation.

Peak Reflow Temperature °C: 245

A peak reflow temperature of 245 °C ensures compatibility with most surface mount soldering methods, making it easy to integrate in manufacturing.

Technical Specifications

Power Field Effect Transistors (FET) STP120NH03L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

700 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.0105 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

240 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP120NH03L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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