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PSMN7R0-40LS,115

NXP Semiconductors

PSMN7R0-40LS,115 by NXP Semiconductors

PSMN7R0-40LS,115 by NXP Semiconductors is a single N-channel MOSFET designed for efficient power management. It supports a max drain current of 40 A and power dissipation of 65 W, operating up to 150 °C. Ideal for applications in automotive and industrial sectors.

Median Price

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1k+

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Digiode

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Vyrian

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Anansix

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ACDS - Activité Composants Distribution Service

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AZTECH Wire

Italy . 229 parts In-Stock

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One Stop Electronics

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UNI Independent Distributors

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Corphita

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Microchip USA

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Perfect Parts

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Cyclops Electronics Ltd (Excess)

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Overview

Elevate your designs with the PSMN7R0-40LS,115 from NXP Semiconductors, a trusted leader in innovation. This cutting-edge N-channel Power FET is designed for efficiency and reliability, delivering exceptional performance in demanding applications like automotive and industrial control systems. With superior thermal management and robust current handling, it empowers your projects while ensuring longevity and value—experience unmatched quality and performance that drives success!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have higher electron mobility, leading to faster switching speeds and better performance compared to P-channel devices.

Configuration: SINGLE

A single configuration simplifies circuit design and layout, making it easier to integrate into various applications without the complexities of multi-channel devices.

Surface Mount: YES

Surface mount technology (SMT) allows for compact designs and better space utilization on PCBs, enhancing overall device performance and efficiency.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are typically 'off' at zero gate voltage, allowing for low power consumption in idle states and enabling efficient design for battery-operated devices.

Maximum Drain Current (Abs) (ID): 40 A

A maximum drain current of 40 A makes this FET suitable for high-power applications, ensuring reliable operation even under demanding conditions.

Maximum Power Dissipation (Abs): 65 W

With a power dissipation of 65 W, this FET can handle substantial power levels without overheating, enhancing system reliability and longevity.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and lower power consumption, making it ideal for a wide range of analog and digital applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C allows the FET to function effectively in harsh environments, widening its application in industrial and automotive sectors.

Technical Specifications

Power Field Effect Transistors (FET) PSMN7R0-40LS,115 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

PSMN7R0-40LS,115 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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