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PSMN7R0-100XS,127

NXP Semiconductors

PSMN7R0-100XS,127 by NXP Semiconductors

PSMN7R0-100XS,127 from NXP Semiconductors is an N-channel enhancement mode FET ideal for power management applications. It supports a max drain current of 55 A and power dissipation of 57 W, operating up to 175 °C. This makes it suitable for high-efficiency designs in automotive and industrial sectors.

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7

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1k+

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Chip Stock

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Vyrian

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Anansix

USA . 2,133 parts In-Stock

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Digiode

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ACDS - Activité Composants Distribution Service

France . 450 parts In-Stock

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Dan-Mar Components

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Bristol Electronics

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AZTECH Wire

Italy . 968 parts In-Stock

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One Stop Electronics

USA . 404 parts In-Stock

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Perfect Parts

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Microchip USA

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Overview

Experience unmatched performance with the PSMN7R0-100XS,127 from NXP Semiconductors—a leader in cutting-edge technology. This N-channel power FET excels in efficiency and reliability, perfectly suited for demanding applications like automotive and industrial systems. With its robust design and high-power handling, it ensures seamless operation even at elevated temperatures. Trust in NXP's commitment to quality and elevate your projects with a superior solution that drives innovation forward.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide better performance in terms of switching speed and power efficiency, making them suitable for high-performance applications.

Configuration: SINGLE

Single configuration allows for simpler circuit design and integration, making this FET a versatile choice for various applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation ensures low power consumption in the off state, which is essential for efficient power management in circuits.

Maximum Drain Current (Abs) (ID): 55 A

A maximum drain current of 55 A indicates high current handling capability, suitable for power applications and devices requiring significant current flow.

Maximum Power Dissipation (Abs): 57 W

With a maximum power dissipation of 57 W, this FET can effectively handle heat generated during operation, ensuring reliability and long-term performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET ideal for integrating into modern electronic circuits.

Maximum Operating Temperature: 175 °C

A high operating temperature of 175 °C allows the FET to be used in extreme environments without degradation in performance.

Maximum Drain Current (ID): 55 A

Reiterating the maximum drain current ensures that this FET is robust enough to handle high-load applications without compromising on performance.

Technical Specifications

Power Field Effect Transistors (FET) PSMN7R0-100XS,127 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

55 A

Maximum Drain Current (ID):

55 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Trade Compliance

PSMN7R0-100XS,127 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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