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BUK1M200-50SDLD,51

NXP Semiconductors

BUK1M200-50SDLD,51 by NXP Semiconductors

BUK1M200-50SDLD,51 from NXP Semiconductors is an N-channel power FET ideal for efficient switching applications. It supports a max drain current of 1.7 A and power dissipation of 9.4 W, operating up to 150 °C. This MOSFET is perfect for compact electronic designs requiring reliable performance.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Vyrian

USA . 7,816 parts In-Stock

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Digiode

USA . 2,831 parts In-Stock

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Anansix

USA . 2,001 parts In-Stock

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One Stop Electronics

USA . 321 parts In-Stock

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$4.050

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Microchip USA

USA . 181 parts In-Stock

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$4.479

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AZTECH Wire

Italy . 392 parts In-Stock

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$21.590

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Native Components

USA . 429 parts In-Stock

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$70.093

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Northwest PG Solutions

USA . 1,614 parts In-Stock

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$77.102

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UNI Independent Distributors

Spain . 5,972 parts In-Stock

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Corphita

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Overview

Unlock the power of performance with the BUK1M200-50SDLD,51 from NXP Semiconductors! Renowned for their innovative engineering, NXP delivers exceptional quality and reliability in this N-channel Power FET. Ideal for diverse applications, it ensures efficient energy management while handling demanding tasks seamlessly. Trust in NXP’s expertise to elevate your designs—experience unmatched value, durability, and superior thermal performance today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel transistors are known for lower on-resistance and higher efficiency, making them ideal for high-speed and power applications.

Surface Mount: YES

Surface mount technology allows for more compact designs, improving space efficiency on PCBs, and is beneficial for automated assembly processes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation offers a normally-off characteristic, allowing for better control and reduced power consumption in idle states.

Maximum Drain Current (Abs): 1.7 A

A maximum drain current of 1.7 A makes this FET suitable for a variety of applications, including signal amplification and switching in moderate power circuits.

Maximum Power Dissipation (Abs): 9.4 W

With a power dissipation capacity of 9.4 W, this FET can handle significant power loads, ensuring reliable operation in demanding environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers the advantages of high input impedance and low power consumption, which ensures a minimal load on the preceding stages and reduces heat buildup.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C enables the FET to perform reliably in high-temperature environments, making it suitable for industrial and automotive applications.

Maximum Drain Current (ID): 1.7 A

Repeating the maximum drain current of 1.7 A underscores its capability to drive moderate loads effectively, reinforcing its versatility in circuit designs.

Technical Specifications

Power Field Effect Transistors (FET) BUK1M200-50SDLD,51 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

1.7 A

Maximum Drain Current (ID):

1.7 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BUK1M200-50SDLD,51 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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