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STP3020L

STMicroelectronics

STP3020L by STMicroelectronics

STP3020L by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a max drain current of 40 A and a breakdown voltage of 30 V. It operates in enhancement mode with a power dissipation of up to 80 W. This robust transistor is suitable for high-temperature environments, reaching up to 175 °C.

Median Price

-

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,837 parts In-Stock

1+ parts

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3,837

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Digiode

USA . 1,361 parts In-Stock

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1,361

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Anansix

USA . 1,171 parts In-Stock

1+ parts

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1,171

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ABC Electronics Ltd.

UK . 750 parts In-Stock

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750

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,705 parts In-Stock

1+ parts

$0.973

100+ parts

-

1k+ parts

$0.876

10k+ parts

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1,705

$0.973

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$0.876

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MKK Technologies

India . 735 parts In-Stock

1+ parts

$1.830

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735

$1.830

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DigiPath Technology Company

USA . 735 parts In-Stock

1+ parts

$1.830

100+ parts

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735

$1.830

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Corphita

USA . 1,789 parts In-Stock

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1,789

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Parana Technologies

USA . 307 parts In-Stock

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$1.164

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307

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$1.164

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Overview

Unlock unrivaled performance and reliability with the STP3020L from STMicroelectronics, a leader in advanced semiconductor solutions. This N-channel power FET excels in switching applications, delivering superior efficiency and robust durability in demanding environments. Its ingenious design ensures seamless integration, allowing you to optimize your projects effortlessly. Empower your innovations with a trusted partner committed to quality and cutting-edge technology!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body provides durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and better performance, making them ideal for high-efficiency applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances design simplicity and can protect the circuit from reverse voltage spikes.

Transistor Application: SWITCHING

Specifically designed for switching applications, this FET delivers fast switching speeds, improving overall efficiency.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V ensures safe operation in high-voltage applications without risk of failure.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space utilization on PCBs, allowing for efficient layout designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical stability and are easier to solder, enhancing reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low power consumption, making it suitable for battery-powered devices.

Maximum Pulsed Drain Current (IDM): 160 A

A high pulsed drain current capacity allows for handling large surges of current, beneficial for power applications.

Maximum Drain Current (Abs) (ID): 40 A

With a maximum drain current of 40A, this FET can efficiently handle substantial loads in various circuits.

No. of Terminals: 3

The 3-terminal configuration simplifies integration into circuits, facilitating versatile application possibilities.

Maximum Power Dissipation (Abs): 80 W

80W of maximum power dissipation ensures this FET can manage heat effectively, supporting high-performance designs.

Package Style (Meter): FLANGE MOUNT

Flange mount style offers easy mechanical mounting options and good heat dissipation, making it suitable for various installations.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides excellent switching speed and efficiency, making it a popular choice for modern electronic devices.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C ensures reliable performance in demanding environments and applications.

Transistor Element Material: SILICON

Silicon as the element material ensures good thermal conductivity and reliable operation across a wide range of conditions.

Terminal Finish: TIN LEAD

Tin-lead terminals enhance solderability and ensure a strong electrical connection in assembled devices.

Maximum Drain Current (ID): 40 A

Consistent maximum drain current rating of 40A highlights its capability to manage significant power loads efficiently.

Maximum Drain-Source On Resistance: 0.038 ohm

An on-resistance of only 0.038 ohms reduces energy losses and improves overall circuit efficiency during operation.

Terminal Position: SINGLE

Single terminal position allows for straightforward wiring and easier PCB design, reducing layout complexity.

Technical Specifications

Power Field Effect Transistors (FET) STP3020L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Maximum Drain-Source On Resistance:

.038 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

160 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP3020L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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